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Aluminum etching agent and preparation method thereof

An aluminum etching and formulation technology, applied in the field of chemical preparations, can solve the problems of delamination between metals, rough surface and residual, obvious difference in etching speed, etc., to achieve the effect of avoiding etching efficiency, stable reaction, and convenient removal of surface dirt

Active Publication Date: 2016-09-28
SUZHOU BOYANG CHEM
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the etchant in the prior art has a significant difference in the etching rate of different metals, resulting in side erosion, delamination between metals, and rough surfaces with residues.

Method used

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  • Aluminum etching agent and preparation method thereof
  • Aluminum etching agent and preparation method thereof
  • Aluminum etching agent and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] Mix according to phosphoric acid: nitric acid: acetic acid: sulfamic acid: water weight ratio 70:5:6:1:18, and then filter to obtain aluminum etchant.

Embodiment 2

[0021] Mix phosphoric acid: nitric acid: acetic acid: sulfamic acid: water in a weight ratio of 72:5:6:3:14, and then filter to obtain an aluminum etchant.

Embodiment 3

[0023] Mix phosphoric acid: nitric acid: acetic acid: sulfamic acid: water in a weight ratio of 75:6:8:4:7, and then filter to obtain an aluminum etchant.

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PUM

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Abstract

The invention belongs to the technical field of chemical preparations, and relates to an aluminum etching agent and a preparation method thereof. The formula of the aluminum etching agent comprises the following components in percentages by weight: 70-78% of phosphoric acid, 5-6% of nitric acid, 6-10% of acetic acid, 1-5% of sulfamic acid, and the balance of water. The aluminum etching liquid provided by the invention can convert a metal compound into soluble salts which are dissolved in water, speeds of etching to different metals are consistent basically, reaction is stable, the circumstance that etching efficiency and neatness of the surface of a substrate are affected by precipitate attachment is avoided, and surface dirt is removed conveniently.

Description

technical field [0001] The invention relates to the technical field of chemical preparations, in particular to an aluminum etchant capable of high-speed and stable etching, smoothing and leaving no residue on the surface of a substrate and a preparation method thereof. Background technique [0002] The main feature of the development of microelectronics technology is to rely on the continuous reduction of the feature size of components, the increase of chip area, and the rapid development of integration and operation speed. Since the 1970s, the development speed of integrated circuit chips has basically followed the law of doubling the integration every 1.5 years, reducing the chip feature size by half every 3 years, increasing the chip area by about 1.5 times, and increasing the number of crystals in the chip by about 4 times. , that is, basically every three years a new generation of IC products comes out. The electronic grade aluminum etchant that is closely related to t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/20
CPCC23F1/20
Inventor 严增源王国洪陈峰钱海书
Owner SUZHOU BOYANG CHEM
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