Cleaning acne mark-removing mask

Abstract

The invention provides a facial mask for cleaning and removing acne scars, which comprises ingredients such as wedelia extract, pseudophysalis extract, yam yam extract, glycerin, butylene glycol, propylene glycol, betaine and the like. The facial mask of the present invention can alleviate the inflammatory reaction caused by cell damage, inhibit the generation of inflammatory mediators, and then reduce the skin damage caused by inflammation, and can effectively clean the skin, promote the disappearance of acne and the repair of acne scars; in addition, the facial mask can Improve blood circulation, promote collagen synthesis, achieve skin repair and regeneration; it can also deeply replenish water, form a water-locking wall, maintain the stability of the skin structure, and make the skin elastic.

Description

technical field [0001] The invention relates to the field of cosmetics, in particular to a facial mask for cleaning and removing acne marks. Background technique [0002] Acne is a symptom of destroying the stratum corneum of the skin and making the skin less resistant. In addition, the old dead cutin will not automatically decrease or fall off, but become the culprit of blocking pores, thus forming acne. In order to get rid of acne entanglement early, many beauty-lovers use various methods to treat, but often the opposite is true, resulting in acne scars that are difficult to remove. [0003] Now the methods of removing scars are: 1. Fractional laser: It can effectively remove scars, remove imprints caused by pigmentation, improve acne scars, and can also shrink pores, sterilize and reduce inflammation. 2. LED blue light: It stimulates the growth of subcutaneous collagen through laser, repairs acne scars, improves dark yellow skin tone, and enhances skin luster. At the sam...

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Problems solved by technology

Most of these phototherapy methods stimulate skin regeneration, and there are certain risks or side...

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