Recovering method for copper-containing waste etching solution
A technology of waste etching solution and recovery method, which is applied in the direction of photography process, instrument, photography auxiliary process, etc., can solve the problems that the recovery of acid copper-containing waste etching solution cannot be handled separately, high efficiency, high environmental benefit, waste of resources and environment, etc. Realize the effect of resource utilization, efficient resource utilization, and good extraction effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Example Embodiment
[0035] The following specific examples illustrate the implementation of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification.
[0036] Such as figure 1 As shown, it shows a specific embodiment of the present invention. As shown in the figure, the copper-containing waste etching solution recovery method disclosed in the present invention includes the following steps:
[0037] (1) The waste copper-containing etching solution is filtered and sent to a neutralization and dilution tank to adjust the pH to 2.6-3.5; the copper-containing waste etching solution at least contains copper-containing acid waste etching solution; the pH of the extractant to the copper-containing etching solution The value requirements are high. According to the copper ion concentration in the etching solution and the number of extraction stages, adjusting the pH to about 2.6 to 3.5 will help t...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap