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A rapid elutriation device for chemical raw materials

A chemical raw material, fast technology, applied in the direction of chemical instruments and methods, cleaning methods and utensils, cleaning methods using liquids, etc., can solve the problems of inconvenient discharge and so on

Active Publication Date: 2020-09-15
福州偌晟科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The left side of the cleaning pool is symmetrically arranged with the left support rod. The bottom of the left support rod is processed with an internal thread, and the internal thread is equipped with a screw. The bottom is welded and fixed on the feet, and the rotation of the screw rod has the effect of raising and lowering the left support rod. After cleaning, turn the screw rod to raise the front and rear left support rods, and the rotating shaft on the left side is Lift the cleaning pool to the right, then close the valve, open the discharge port, the wind is blown out from the air port on the right, and the cleaned raw materials are quickly discharged from the discharge port under the dual action of gravity and wind force. Drop out at the mouth, which solves the problem of inconvenient discharge of the deep cleaning tank, and the raw materials will not accumulate at the bottom of the cleaning tank

Method used

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  • A rapid elutriation device for chemical raw materials
  • A rapid elutriation device for chemical raw materials
  • A rapid elutriation device for chemical raw materials

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Embodiment Construction

[0017] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0018] see figure 1 and Figure 5 , in an embodiment of the present invention, a chemical raw material rapid elutriation device, comprising a cleaning tank 1; a blanking port 2 is provided at the bottom of the cleaning tank 1, and a plug 11 is arranged in the blanking port 2, and the plug 11 The bottom is welded and fixed on the upper end surface of the mounting plate 15, the mounting plate 15 is provided with a through hole 13, the screw 14 is threaded throu...

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Abstract

The invention discloses a chemical raw material rapid washing device. The device comprises a cleaning pond, a discharging opening is formed in the bottom of the cleaning pond, a fan is arranged abovethe cleaning pond, an air pipe is communicated with the lower portion of the fan, and a left branch pipe and a right branch pipe are communicated with the lower portion of the air pipe; hoses are bonded and fixed at the ends of the left and right branch pipes, and the hoses are clamped in grooves; the grooves are formed in the left wall and the right wall of the cleaning pond, and air outlets areformed in the grooves and are communicated with an inner cavity of the cleaning pond; lugs are welded and fixed to the left and right outer walls of the cleaning pond, and a rotating shaft is rotationally installed in the lugs. According to the device, ventilation is conducted in the washing process, rolling friction of materials is achieved, the cleaning effect is greatly improved, and meanwhile,the cleaning time is shortened; the problem that the cleaning pond is too deep to obtain the materials conveniently is solved after cleaning is completed, the raw materials cannot be accumulated at the bottom of the cleaning pond, the practicability is extremely high, and the effect is remarkable.

Description

technical field [0001] The invention relates to the technical field of chemical equipment, in particular to a quick elutriation device for chemical raw materials. Background technique [0002] The cleaning of chemical raw materials is an important part of the chemical production process. The purpose is to wash away the dust, sediment and other impurities attached to the surface of the raw materials to ensure the purity and cleanliness of the raw materials, so as to ensure the quality of the products produced by subsequent reactions. [0003] In the prior art, the cleaning method of chemical raw materials is usually dipping method or spray cleaning method; the dipping method is to directly soak the chemical raw materials in the cleaning pool, and then take them out after simple manual stirring. The cleaning effect of this method is It is not good and the removal efficiency of chemical raw materials after cleaning is low; while the cleaning effect of spray cleaning method is g...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B3/10B08B13/00
CPCB08B3/102B08B13/00
Inventor 管洪化
Owner 福州偌晟科技有限公司
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