Online measurement device of gas partial pressure and online measurement method thereof

A measuring device and technology of gas partial pressure, applied in the field of measurement, can solve the problems of inaccurate measurement results and insufficient sensitivity, and achieve the effects of avoiding cross-contamination, ensuring accuracy, and avoiding interference

Active Publication Date: 2019-10-25
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Abstract
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  • Application Information

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Problems solved by technology

Using this device to measure the partial pressure of coarse and low vacuum gases has the problems of insufficient sensitivity and inaccurate measurement results.

Method used

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  • Online measurement device of gas partial pressure and online measurement method thereof
  • Online measurement device of gas partial pressure and online measurement method thereof
  • Online measurement device of gas partial pressure and online measurement method thereof

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Embodiment Construction

[0042]Exemplary embodiments of the present disclosure will be described in more detail below based on examples. Although exemplary embodiments of the present disclosure have been shown in the specification, it should be understood that the present disclosure can be embodied in various forms and should not be limited by the embodiments set forth herein. Rather, these embodiments are provided for more thorough understanding of the present disclosure and to fully convey the scope of the present disclosure to those skilled in the art.

[0043] Such as figure 1 As shown, the present invention proposes an online measurement and calibration device for gas partial pressure, which includes a vacuum chamber, a sampling channel, a nitrogen filling channel, an air pump group, a mass spectrometry module, a valve assembly and a data acquisition control module. Among them, there are four vacuum chambers, which are the gas source chamber to be tested 101, the calibration gas source chamber 1...

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Abstract

The invention relates to an online measurement device of gas partial pressure and an online measurement method thereof. The online measurement device comprises a to-be-measured gas source chamber, a calibration gas source chamber, a pressure reduction chamber, a constant pressure chamber, a vacuum gauge and a mass spectrometry module, wherein a high pressure to-be-measured gas sample injection channel and a medium pressure to-be-measured gas sample injection channel are arranged between a first intake valve and the pressure reduction chamber, a low-pressure to-be-measured gas sample injectionchannel is arranged between the first intake valve and the constant pressure chamber, a calibration gas sample injection channel is arranged between a sixth intake valve and the pressure reduction chamber, a gas circulation channel is arranged between the pressure reduction chamber and the constant pressure chamber, the vacuum gauge is used for measuring vacuum degree of the four chambers above, and the mass spectrometry module is used for online measurement for gas of the constant pressure chamber. The measurement method comprises steps of determining standard sample gas, performing cleanliness detection, acquiring mass spectrometer sensitivity, performing vacuum pumping to remove residual gas and performing online measurement of gas partial pressure. The online measurement device and theonline measurement method of the invention mainly aim at coarse and low vacuum gas analysis, select an optimal sample injection channel according to pressure of the to-be-measured gas and are more accurate in partial pressure measurement.

Description

technical field [0001] The invention relates to the field of measurement technology, in particular to an on-line measurement device for gas partial pressure and an on-line measurement method thereof. Background technique [0002] In the field of industrial production, it is often necessary to analyze the composition and concentration of various process gases. The extreme ultraviolet lithography (EUVL) vacuum system needs to monitor the partial pressure of the gas in each vacuum microenvironment closely. During the working process (the vacuum microenvironment is a low vacuum on the order of several Pa), it is necessary to strictly control its N 2 , O 2 、H 2 O and C x h y The partial pressure of the component. The quadrupole mass spectrometer is the only equipment suitable for residual gas analysis and measurement in vacuum, but it must be within 10 -2 Operate below Pa vacuum. At the same time, the characteristics of the semiconductor industry require that extreme ultr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N27/62
CPCG01N27/62
Inventor 罗艳吴晓斌朱精果王魁波张罗莎谢婉露
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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