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5results about How to "Avoid selectivity" patented technology

A noise reduction method for vibration signals in structural health monitoring based on hybrid neural networks

This invention proposes a method for denoising vibration signals from structural health monitoring based on a hybrid neural network. This method, implemented according to embodiments of the invention, eliminates the need for prior signal knowledge and manual parameter settings. It effectively removes various noise types from structural health monitoring vibration signals, significantly improves the signal-to-noise ratio, and reduces the root mean square error, achieving efficient and automated noise reduction of vibration signals.
Owner:BEIJING JIAOTONG UNIV +1

A Method and System for Suppressing Baseline Drift in ECG Signals Based on Cascaded Singular Spectrum Analysis

ActiveCN116849675BImprove the situation of unsatisfactory drift suppressionavoid inconvenienceSensorsDiagnostic recording/measuring
This invention relates to a method and system for suppressing baseline drift in electrocardiogram (ECG) signals based on cascaded singular spectrum analysis (SSA). The method includes: acquiring ECG signal data affected by baseline drift, setting the number of layers i = 1; and extracting baseline drift noise n from the ECG signal data affected by baseline drift using SSA with a window length of 2. i With ECG signal components o i Its central electrical signal ECG i Obtained through a formula; calculate baseline drift noise n. i With electrocardiogram (ECG) signal i inner product IP i Determine if the inner product has reached its minimum value. If the inner product has reached its minimum value, output the ECG signal of the current layer. i As a final result of suppressing baseline drift, otherwise, the baseline drift noise n i Using ECG signal data affected by baseline drift and incrementing the layer number i by 1, repeat the above extraction and calculation operations until the inner product reaches its minimum value, then output the ECG signal of the current layer. i .
Owner:DONGGUAN UNIV OF TECH

A multi-level control mode adaptive switching method and system based on task constraints

PendingCN122546980AImprove adaptabilityavoid selectivity
This invention discloses a multi-level control mode adaptive switching method and system based on task constraints. For different task types, the remote control center issues different task type identifiers and corresponding task constraint strategy information. During the task initiation preparation phase and task execution, the nest-side edge computing controller continuously collects network, task, and UAV status data, dynamically determines the most suitable target control mode, and performs control handover, state synchronization, and instruction semantic level switching when the target control mode is inconsistent with the current control mode. This achieves coordinated and consistent adjustment of control mode, control ownership, task state machine, and instruction semantics. This invention improves the continuity, security, and stability of UAV system task execution under different network conditions and task constraints.
Owner:NANJING KANGNI MECHANICAL & ELECTRICAL

Wet etching equipment for wafer and feeding system thereof

ActiveCN224218787UAvoid etch rateavoid selectivityPipe heating/coolingPipeline systemsO-Phosphoric AcidWafer
The utility model provides wet etching equipment for wafers and a feeding system of the wet etching equipment. The feeding system comprises a mixing device and a liquid silicon dioxide supply part, the mixing device comprises a mixed liquid storage part and a circulating mechanism; the mixed liquid storage part is connected with the liquid silicon dioxide supply part; the circulating mechanism comprises a circulating pipeline and a first pump, two ends of the circulating pipeline are respectively communicated with the mixed liquid storage part, and the first pump is arranged on the circulating pipeline. The mixed liquid storage part is used for accommodating a phosphoric acid solution and receiving liquid silicon dioxide from the liquid silicon dioxide supply part, and the liquid silicon dioxide and the phosphoric acid solution are uniformly mixed under the action of the first pump to form a uniform silicon dioxide-phosphoric acid solution. The feeding system is applied to the wet etching equipment for wafers so as to carry out acid exchange operation on the wet etching equipment, and the change of the etching rate and the selection ratio of SIN / SiO2 caused by the great reduction of the concentration of silicon ions in an etching tank due to acid exchange can be avoided.
Owner:CHONGQING XINLIAN MICROELECTRONICS CO LTD