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On-line measuring device and on-line measuring method of gas partial pressure

A measuring device and gas partial pressure technology, applied in the field of measurement, can solve the problems of insufficient sensitivity and inaccurate measurement results, and achieve the effect of ensuring accuracy, avoiding cross-contamination, and ensuring regular calibration

Active Publication Date: 2022-02-08
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Using this device to measure the partial pressure of coarse and low vacuum gases has the problems of insufficient sensitivity and inaccurate measurement results.

Method used

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  • On-line measuring device and on-line measuring method of gas partial pressure
  • On-line measuring device and on-line measuring method of gas partial pressure
  • On-line measuring device and on-line measuring method of gas partial pressure

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Embodiment Construction

[0042]The following exemplary embodiments of the present disclosure will be described in more detail with reference to Examples. While the exemplary embodiment shows an exemplary embodiment of the present disclosure in the specification, it should be understood that the present disclosure may be implemented and should not be limited to the embodiments set forth herein in various forms. Rather, these embodiments are able to more thorough understanding of the present disclosure, and the scope of the present disclosure can be completely conveying to those skilled in the art.

[0043] like figure 1 , The present invention provides online measurement and calibration apparatus of the partial pressure of a gas, the apparatus comprising a vacuum chamber into the loading channel, channel nitrogen, suction pump, mass spectral analysis module, a control valve assembly and data acquisition module. Wherein the vacuum chamber includes 4, respectively measured gas source chamber 101, the calibra...

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Abstract

The invention relates to an on-line measurement device and an on-line measurement method for gas partial pressure. The on-line measurement device includes a gas source chamber to be measured, a calibration gas source chamber, a decompression chamber, a constant pressure chamber, a vacuum gauge and a mass spectrometry analysis module. Among them, a high-pressure gas to be tested sampling channel and a medium-pressure gas to be tested sampling channel are arranged between the first inlet valve and the decompression chamber, and a low-pressure gas to be tested is installed between the first inlet valve and the constant pressure chamber. Sampling channel, a calibration gas sampling channel is provided between the sixth inlet valve and the decompression chamber, a gas circulation channel is provided between the decompression chamber and the constant pressure chamber, and the vacuum gauge is used to measure the above four chambers The vacuum degree of the chamber, the mass spectrometry module is used to measure the gas in the constant pressure chamber online; the measurement method includes the online measurement steps of determining the standard sample gas, checking the cleanliness, obtaining the sensitivity of the mass spectrometer, vacuuming to remove residual gas and gas partial pressure. The on-line measurement device and method of the present invention are mainly aimed at the analysis of rough and low vacuum gases, and the optimal sampling channel is selected according to the pressure of the gas to be measured, so that the partial pressure measurement is more accurate.

Description

Technical field [0001] The present invention relates to the field of measurement, and Background technique [0002] In an industrial production area, the components and concentrations of various process gases are often required. Ultraviolet Lightning Machine (EUVL) Vacuum system requires the online rigid monitoring of gas partial pressure in each vacuum micro environment, such as its start and stop (the vacuum micro environment is rude), requires monitoring of each gas component partial pressure; During the working process (the vacuum micro environment is a few PA levels of low vacuum), it is necessary to strictly control its N 2 O 2 H 2 O and C x Hide y The partial pressure of the component. The four-pole mass spectrometer is the only equipment that is suitable for the measurement of residual gas analysis in vacuo, but it must be in 10 -2 PA The vacuum is running below. At the same time, the semiconductor industry features that extreme ultraviolet light cannot be downturbed freq...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N27/62
CPCG01N27/62
Inventor 罗艳吴晓斌朱精果王魁波张罗莎谢婉露
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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