Liquid baffle structure, etching equipment prepared from liquid baffle structure and etching method

Abstract

The invention relates to a liquid baffle structure, etching equipment prepared from the liquid baffle structure and an etching method, in particular to the liquid baffle structure which is suitable for liquid blocking and discharging functions of a wet etching machine and improves the air permeability of the wet etching machine so as to reduce product loss, the etching equipment prepared from the liquid baffle structure and the etching method. By means of the design that the liquid baffle structure with the plurality of venting holes is matched with an air knife device, air blown out by the air knife device can be effectively vented through the venting holes, and the surface tension phenomenon of water drops is utilized to prevent the water drops from falling from the venting holes to cause abnormal phenomena such as non-uniform development of the substrate, so that main advantages that the liquid blocking effect of an original liquid blocking plate is ensured, and the air permeability is increased to break vacuum so as to reduce the risk that the substrate is scratched or broken due to the vacuum suction plate are achieved.

Description

technical field [0001] The invention relates to a liquid baffle structure and the etching equipment and etching method prepared therefrom, in particular to a liquid baffle that is suitable for the liquid blocking and draining function of a wet etching machine and increases its air permeability to reduce product loss Structure and etching equipment prepared therefrom, and etching method. Background technique [0002] see figure 1 As shown, it is a schematic diagram of the overall arrangement of the traditional liquid baffle structure, wherein a liquid baffle structure A in the form of a solid PVC plate is set in a wet etching machine (not shown in the drawing), and is mainly used to block an etching liquid ( (not shown in the drawing) spraying the substrate (not shown in the drawing) arranged under the liquid baffle structure A causes uneven etching, and in the process steps of wet etching, the substrate is arranged on two air knives Between B, when the substrate is set on ...

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Problems solved by technology

[0002] see figure 1 As shown, it is a schematic diagram of the overall arrangement of the traditional liquid baffle structure, wherein a liquid baffle structure A in the form of a solid PVC plate is set in a wet etching machine (not shown in the drawing), and is mainly used to block an etching liquid ( (not shown in the drawing) spraying the substrate (not shown in the drawing) arranged under the liquid baffle structure A causes uneven etching, and in the process steps of wet etching, the substrate is arranged on two air knives Between B, when the substrate is set on a conveying device (not shown in the drawing) and receives the etching solution from the left side of the liquid baffle structure A, it moves between the air knives B, and the air knives B spray again A gas C is blown to the surface of the substrate to blow off the residual etching solution on the surface of the substrate; however, when the air knives B are blowing air, it is easy to form tiny The vortex is formed in the vacuum space and causes the problem of the vacuum suction plate; therefore, how to effectively use the innovative hardware design to achieve the liquid blocking effect of the original liquid baffle, and increase the air permeability to break the vacuum to reduce the vacuum caused by the vacuum suction plate The risk of substrate scratches or fragments is still a problem that developers and researchers in related industries such as wet etching machines need to continue to work hard to overcome and solve

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