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Method for object treatment

A technology for objects and mixtures, which can be used in cleaning methods using liquids, cleaning methods using gas flow, mixing methods, etc., and can solve the problems of lack of disclosure, high cost, and use of large amounts of ozone.

Inactive Publication Date: 2005-04-06
FSI INTERNATIONAL INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, these systems require the use of large amounts of ozone, making them relatively expensive
In addition, these patents do not disclose methods to optimize the ozone concentration at the point of use, so ozone may bubble out of the solution at the point of use even though the dissolved amount of ozone is increased by cooling the solution

Method used

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Examples

Experimental program
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Effect test

Embodiment 1

[0063] This experiment was performed to show the effect of different dispensing techniques on the amount of ozone retained in the aqueous ozone solution at the point of use. The effect on the efficiency of the dispensing method was evaluated as the following parameters were varied: atomizing gas pressure, nozzle design, and mixture flow through the nozzle.

[0064] The initial ozone concentration was determined by withdrawing a side stream of ozone water from a pressurized vessel and measuring the dissolved ozone concentration using an industrially available sensor. A second sensor is used to measure the dissolved ozone concentration after the liquid has been dispensed through the spray column by collecting the liquid and funneling it into the sensor. The percentage concentration of ozone remaining in solution is determined by the formula [O 3最终 ] / [O 3初始 ]×100 to calculate, where the symbol [O 3 ] represents the concentration of ozone dissolved in water.

[0065] Atomizati...

Embodiment 2

[0073] This experiment was performed to show the effect of increased ozone concentration on the oxidation of silicon surfaces. In this experiment, the dispensing technique and all other parameters were held constant and only the pressure of the pressurized vessel was varied. As the pressure changes, the concentration of ozone dissolved in the water changes, thus changing the time required to fully oxidize the silicon surface.

[0074] Specifically, when the ozone generator is set to low power and the pressure of the pressurized container is kept at 0 psi (0 kilopascals), 1.0 ppm of ozone water is produced; when the ozone generator is set to high power and the pressure of the pressurized container is kept at When 0psi (0 kilopascals), produce the ozone water of 10.0ppm; And when the ozone generator is set to high power and keep the pressure of the pressurized container at 25psi (172.4 kilopascals), produce the ozone water of 50.0ppm; Then the ozone Water is dispensed onto the ...

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Abstract

A method for increasing the quantity of a gas, e.g., ozone, dissolved in a liquid, e.g., ultrapure deionized water, are provided. The gas to be dissolved is introduced to the liquid under pressure and the resulting admixture delivered to the end-use station under pressure. Once at the end-use station, the admixture including the liquid and dissolved gas is subjected to controlled dispensing to maintain a high concentration of gas in the dispensed admixture.

Description

technical field [0001] The invention relates to a method of handling objects. More specifically, the present invention relates to a method for treating an object to be treated with a mixture comprising ozone dissolved in an aqueous liquid in a container by a process comprising the step of dissolving ozone in an aqueous liquid under pressure And prepared. Background technique [0002] Ozone has long been recognized as a particularly useful chemical due to its excellent oxidizing activity. In fact, ozone is the fourth most oxidizing chemical known, with an oxidation potential of 2.07 volts. Because of this property, ozone and / or fluid mixtures containing ozone are able to remove a variety of contaminants from surfaces such as cyanide, phenol, iron, manganese, and detergents. Additionally, ozone and / or fluid mixtures containing ozone can oxidize surfaces. Specifically, in the semiconductor industry, ozonated water is used to "clean", ie oxidize, the su...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B5/00B01F3/04B08B3/02C02F1/78
CPCB08B3/02Y10S210/90Y10S261/42Y10S261/65Y10S134/902C02F2201/782C02F1/78
Inventor 史蒂文·L·纳尔逊库尔特·K·克里斯坦森
Owner FSI INTERNATIONAL INC
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