Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Nasal mask assembly

一种面具、呼吸面具的技术,应用在呼吸面具、药物的器械、其他医疗器械等方向

Inactive Publication Date: 2006-03-22
RESMED LTD
View PDF15 Cites 26 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This in itself creates a potential pivot point as it does for adults, however, this effect is accentuated by the fact that there is no offset from the infant's cheek due to the smaller facial area

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Nasal mask assembly
  • Nasal mask assembly
  • Nasal mask assembly

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0075] Figure 2-5 shows the well-known VISTA TM Existing masks are produced by ResMed Associates. The mask assembly 100 includes (i) a soft face contact cushion 110 (ii) swivel guide 130, (iii) headgear clip 140, (iv) a body adapted to fit the cushion 110 and support the swivel guide 130 and headgear clip 140 A frame 120, and (v) headgear 150 including straps 160 and a headgear yoke 170.

[0076] The stability of the cushion 110 and frame 120 on the face 220 of the adult patient 200 is aided by the size, shape, and location of the yoke 170 on the headgear 150 . Regardless of the issues identified by Sullivan & Wilkie regarding the impact of fulcrums and torsional forces on existing masks, minors can obtain greater stability using masks consistent with the present invention. In one embodiment, the current inventor has redesigned the VISTA in Figures 2 to 5 TA Masks are intended for use by minors, or by adults with small or child-like facial features.

[0077] Figure 6-16 ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A mask system is provided to fit pre-adult patients, or patients having facial features that are very small or child-like, e.g., patients having dimensions in the lower 5%-10% of the population. For example, the headgear and / or cushion are dimensioned to accommodate this range of patients.

Description

[0001] This application claims priority to U.S. Patent Application No. 60 / 448,533, filed February 21, 2003, and U.S. Patent Application No. 60 / 465,790, filed April 28, 2003, which are hereby incorporated by reference fully bonded. technical field [0002] The present invention relates to a nasal mask assembly for use with non-invasive normal pressure ventilation (NIPPV) for minors with sleep-disordered breathing (SDB). Background technique [0003] Sleep-disordered breathing is a general period of a sleep disorder with apneas and hypopneas. Apnea typically stops the flow of air for ten seconds or more. Hypopnea reduces air flow by 50% or more for ten seconds or more. Both apnea and hypopnea result in sleep arousals - a period of time during which a person wakes up long enough to allow breathing to continue but not long enough to remember any interruption in sleep. Some awakenings only cause the sleeper to enter a light sleep state. In both cases, sleep arousal reduced sl...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61M16/00A61M16/06
CPCA61M2210/0618A61M16/06A61M16/0683A61M16/0622A61M16/0616
Inventor 安东尼·米迦勒·金菲利普·罗德尼·夸克加里·克里斯托弗·鲁滨逊雷恰尔·穆尔比亚努·桑托索帕特里克·约翰·麦考利夫
Owner RESMED LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products