Provided is a total reflection X-
ray fluorescence spectrometer which has high analysis sensitivity and analysis speed. The total reflection X-
ray fluorescence spectrometer includes: an X-
ray source that has an
electron beam focal point having an effective width in a direction parallel to a surface of a sample, and orthogonal to an X-
ray irradiation direction, that is larger than a dimension in the
irradiation direction; a reflective optic that has an effective width in the orthogonal direction that is larger than that of the
electron beam focal point, and has a curved surface in the
irradiation direction; and a plurality of detectors that are arranged in a row in the orthogonal direction, and are configured to measure intensities of fluorescent X-rays emitted from the sample irradiated with primary X-rays focused by the reflective optic.