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System for continuous batch preparing diamond film

A diamond film and preparation system technology, which is applied in metal material coating process, gaseous chemical plating, coating and other directions, can solve the problems such as the reduction of diamond film preparation efficiency

Inactive Publication Date: 2008-05-14
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

To prepare CVD diamond film in this way, every time a new filament is used, it needs to spend about 9 hours more in terms of filament installation, vacuuming, filament carbonization, and vacuum chamber inflation, which greatly reduces the preparation efficiency of diamond film.

Method used

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  • System for continuous batch preparing diamond film
  • System for continuous batch preparing diamond film
  • System for continuous batch preparing diamond film

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Embodiment Construction

[0029] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0030] As shown in Figures 1, 2, and 3.

[0031] Figure 1 is a schematic diagram of a CVD diamond film continuous preparation system. In the figure, the substrate 2 on which the diamond film is deposited is placed on the substrate water-cooled workbench 1, and the substrate 7 to be deposited is placed on the substrate warehouse 8 that can be rotated at a certain angle. The substrate 7 to be deposited on the platform is placed on the workbench 1, and the substrate on which the CVD diamond film deposition has been completed on the workbench 1 is taken back to the substrate warehouse 8. The substrate warehouse 8 can be used as shown in FIG. Single warehouse and single-layer structure can also be designed as a single-layer multi-chamber structure according to needs. Each substrate warehouse rotates around the center driven by a conventional mechanical tran...

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Abstract

A system for continuously preparing the CVD diamond film in batches features that the substrate storage is installed to surround the substrate bench, the pull rod in a telescopic rod connected to manipulator has one end screwed to the executing unit of manipulator and another end with a handwheel, and a flexible metal pipe has one end connected to the casing around a conic hole in sealed mode and another end connected to said telescopic rod in sealed mode.

Description

technical field [0001] The invention relates to a chemical vapor deposition diamond film manufacturing system, in particular to a preparation system capable of continuously batch preparing diamond films. Background technique [0002] At present, the mechanical, thermal, acoustic, electrical, optical and chemical properties of chemical vapor deposition (CVD) diamond have reached or approached those of natural diamond, and have broad application prospects in today's high-tech fields. The preparation of diamond film by hot wire CVD has the advantages of fast growth rate, strict control of growth condition parameters, wide reaction chamber pressure range, large film forming area, small equipment investment, simple structure, and industrial production. The CVD method is currently one of the most commonly used methods for preparing CVD diamond films. When the diamond film is deposited by the hot wire CVD method, firstly, the substrate material for depositing the diamond film need...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/27C23C16/458
Inventor 左敦稳卢文壮徐锋黎向锋余亚平王珉
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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