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Coating equipment

A coating device and coating technology, which is applied to the surface coating liquid device, coating, etc., can solve the problems of substrate surface coating abnormality, scraper nozzle damage and scratching, etc., and achieve the reduction of coating abnormality Effect

Inactive Publication Date: 2009-03-11
HONG FU JIN PRECISION IND (SHENZHEN) CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In order to overcome the disadvantages that the coating device in the coating process of the prior art will cause abnormal coating on the substrate surface and damage to the scraper nozzle due to the particles on the substrate to be coated, the present invention provides a coating that can be used during the coating process. Coating device for removing particles on the substrate to be coated

Method used

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  • Coating equipment
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Embodiment Construction

[0012] see Figure 4 , is a schematic diagram of the coating device 20 of the present invention. The coating device 20 includes a platform 30 , a nozzle cleaning tank (not shown), a coating mechanism 40 and a dust removal device 50 .

[0013] The platform 30 absorbs and fixes the substrate 21 to be coated by vacuum adsorption principle. The nozzle cleaning tank is provided at the end of the platform 30 .

[0014] The coating mechanism 40 includes a scraper nozzle 41 , a photoresist material supply device 42 , a pair of first supports 43 and a driving device (not shown). The pair of first brackets 43 are disposed on both sides of the platform 30 , the scraper nozzle 41 spans above the platform 30 , and its two ends are erected on the first brackets 43 . The photoresist material supply device 42 is connected with the scraper nozzle 41 and supplies the photoresist material to be coated thereto. The driving device is used to drive the scraper nozzle to reciprocate on the first...

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Abstract

A photoresist coating process is composed of a platform for supporting a substrate, a coating unit above said platform for coating photoresist on said substrate, and an ultrasonic cleaner for removing dust from said substrate before coated.

Description

【Technical field】 [0001] The invention relates to a coating device, in particular to a coating device for coating photoresist materials. 【Background technique】 [0002] In the liquid crystal display device manufacturing process, it is necessary to uniformly coat a layer of photoresist material with a specific thickness on the glass substrate. [0003] A coating device in the prior art is to coat the photoresist on the glass substrate by blade coating. Such as figure 1 Shown is a schematic diagram of a prior art blade coating apparatus. The scraper coating device 10 includes a platform 16 , a scraper nozzle 11 , a photoresist supply device 12 and a nozzle cleaning tank 15 . The platform 16 is used to support and fix the substrate 13 to be coated. The scraper nozzle 11 is disposed above the platform 16 and connected to the photoresist material supply device 12 . The nozzle cleaning tank 15 is disposed at the rear end of the platform 16 for cleaning the scraper nozzle 11 ....

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B05C5/02B05C9/10
Inventor 邓振坤王敬龙许文诚詹育颖曾增魁谢和利
Owner HONG FU JIN PRECISION IND (SHENZHEN) CO LTD