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Immersion micro-image syatem and preparing process thereof

A lithography, liquid crystal controller technology, applied in the field of lithography system, can solve the problems of inconvenience, general products without structure, unable to adjust the refractive index and focus depth to optimize and so on

Active Publication Date: 2010-03-17
TAIWAN SEMICON MFG CO LTD
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  • Description
  • Claims
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Problems solved by technology

Generally, immersion lithography uses water as the medium, and its refractive index is generally low, so it is impossible to optimize its refractive index and depth of focus
[0004] It can be seen that the above-mentioned existing immersion lithography system and its manufacturing process obviously still have inconveniences and defects in product structure, manufacturing method and use, and need to be further improved urgently.
In order to solve the above-mentioned problems, the relevant manufacturers have tried their best to find a solution, but no suitable design has been developed for a long time, and the general products do not have a suitable structure to solve the above-mentioned problems. This is obviously related. The problem that the industry is eager to solve

Method used

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  • Immersion micro-image syatem and preparing process thereof
  • Immersion micro-image syatem and preparing process thereof

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Embodiment Construction

[0047] In order to further explain the technical means and effects of the present invention to achieve the intended purpose of the invention, the specific implementation, structure, and manufacturing of the immersion lithography system and its manufacturing process proposed according to the present invention will be described below in conjunction with the accompanying drawings and preferred embodiments. The method, steps, features and effects thereof are described in detail below.

[0048] see figure 1 As shown, in the first embodiment, the liquid crystal immersion lithography system 100 may at least include a light emitting source 110 . The light source 110 can be a suitable light source. For example: the light source 110 can be a mercury lamp with a wavelength of 436nm (G-line) or a wavelength of 365nm (I-line), a krypton fluoride excimer laser (Excimer Laser) with a wavelength of 248nm, or an argon fluoride with a wavelength of 193nm. Excimer lasers, fluorine excimer lase...

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Abstract

To provide an objective lens used for a liquid crystal immersion lithography process. An immersion lithography system comprises: an objective lens ; a substrate stage positioned below the objective lens ; a liquid crystal at least partially filling a space between the objective lens and a substrate on the substrate stage ; and a liquid crystal controller having a first electrode and a second electrode for controlling the liquid crystal .

Description

technical field [0001] The invention relates to a lithography system, in particular to a liquid crystal immersion lithography system (Immersion Lithography System) and its manufacturing process. Background technique [0002] Semiconductor integrated circuit technology has advanced rapidly, including continuous reduction in feature size and maximization of packaging density. Feature size reduction is dependent on improvements in optical lithography and its ability to print smaller feature sizes. The minimum feature size in an optical lithography system can be determined in part by diffraction, which is related to the wavelength of light and the medium through which it passes. Therefore, a way to reduce size and improve resolution is to use light with shorter wavelengths. [0003] Another method is to use a medium other than air between the lens and the substrate. Since the refractive index of this medium (called 'n') is greater than 1, the wavelength in the medium is short...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G02F1/13H01L21/00
CPCG03F7/70341G03F7/2041G03F7/70958
Inventor 林进祥施仁杰
Owner TAIWAN SEMICON MFG CO LTD
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