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Immersion lithography apparatus and method

A lithography and liquid crystal controller technology, applied in the field of lithography systems, can solve the problems of inability to optimize the refractive index and depth of focus, general products without structure, inconvenience, etc.

Active Publication Date: 2007-04-25
TAIWAN SEMICON MFG CO LTD
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Problems solved by technology

Generally, immersion lithography uses water as the medium, and its refractive index is generally low, so it is impossible to optimize its refractive index and depth of focus
[0004] It can be seen that the above-mentioned existing immersion lithography system and its manufacturing process obviously still have inconveniences and defects in product structure, manufacturing method and use, and need to be further improved urgently.
In order to solve the above-mentioned problems, the relevant manufacturers have tried their best to find a solution, but no suitable design has been developed for a long time, and the general products do not have a suitable structure to solve the above-mentioned problems. This is obviously related. The problem that the industry is eager to solve

Method used

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[0047] In order to further illustrate the technical means and effects adopted by the present invention to achieve the predetermined purpose of the invention, the following describes the specific implementation, structure, manufacturing process of the immersion lithography system and its manufacturing process according to the present invention with reference to the accompanying drawings and preferred embodiments. The methods, steps, features and their effects are described in detail as follows.

[0048] Referring to FIG. 1 , in the first embodiment, the liquid crystal immersion lithography system 100 may at least include a light source 110 . The light source 110 can be a suitable light source. For example, the light source 110 can be a mercury lamp with a wavelength of 436 nm (G-line) or a wavelength of 365 nm (I-line), a krypton fluoride excimer laser with a wavelength of 248 nm, or an argon fluoride with a wavelength of 193 nm. Excimer lasers, fluorine excimer lasers with a ...

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Abstract

To provide an objective lens used for a liquid crystal immersion lithography process. An immersion lithography system comprises: an objective lens ; a substrate stage positioned below the objective lens ; a liquid crystal at least partially filling a space between the objective lens and a substrate on the substrate stage ; and a liquid crystal controller having a first electrode and a second electrode for controlling the liquid crystal .

Description

technical field [0001] The invention relates to a lithography system, in particular to a liquid crystal immersion lithography system (Immersion Lithography System) and its manufacturing process. Background technique [0002] There have been rapid advances in semiconductor integrated circuit technology, including continued shrinking of feature sizes and maximization of packaging density. The feature size reduction is due to improvements in optical lithography and its ability to print smaller feature sizes. The smallest feature size in an optical lithography system can be determined in part by diffraction, which is related to the wavelength of light and the medium through which the light passes. Therefore, a way to reduce size and improve resolution is to use light with shorter wavelengths. [0003] Another method is to use a medium other than air between the lens and the substrate. Since the refractive index of this medium (called 'n') is greater than 1, the wavelength in ...

Claims

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Application Information

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IPC IPC(8): G03F7/20G02F1/13H01L21/00
CPCG03F7/70341G03F7/2041G03F7/70958
Inventor 林进祥施仁杰
Owner TAIWAN SEMICON MFG CO LTD
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