Stepping arrangement type interference microlithography and device thereof

An arrayed and periodic technology, which is applied in photolithography process exposure devices, microlithography exposure equipment, etc., can solve problems such as application limitations and difficult photoresist material selectivity.

Active Publication Date: 2009-01-14
IND TECH RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This method uses a circular Gaussian beam, so multiple overlapping exposures are required. Due to the size of the intersection area and the number of times, it is not easy to achieve a completely uniform distribution of the exposur...

Method used

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  • Stepping arrangement type interference microlithography and device thereof
  • Stepping arrangement type interference microlithography and device thereof
  • Stepping arrangement type interference microlithography and device thereof

Examples

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Embodiment Construction

[0062] see figure 2 As shown, this figure is a schematic flow chart of an embodiment of the step-and-array interference lithography method for producing periodic patterns in the present invention. The interference lithography method 2 includes the following steps: first, step 20 is performed, providing at least two coherent light beams of a specific shape and a substrate to be exposed. Please refer to FIG. 3(A), the aforementioned so-called specific shape can be a polygon, such as a triangle, a quadrangle or a hexagon, etc., but not limited thereto. Besides, as shown in FIG. 3(B), the specific shape may also have at least one arc-shaped side. Please refer to FIG. 4(A) and FIG. 4(B), which are schematic diagrams of the present invention to be exposed. In FIG. 3(A), the substrate to be exposed 80 may be a flat substrate; in FIG. 3(B), the substrate to be exposed 81 is a substrate with a curved surface, such as a cylindrical substrate. The materials of the substrates 80 and 8...

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Abstract

The invention provides a stepping queuing interference lithography method and a corresponding apparatus used for making cyclical patterns. At least two homology beams of special shapes are controlled to be projected onto a base material to be exposed so as to form interference fringes of a special zone size. Then the positions of the base material to be exposed or the two homology beams of special shapes are controlled through the stepping movement of times so as to form a preset pattern in a large area on the base material to be exposed. The method of the invention can shorten the optical transmission path and the exposure time so as to further reduce the generation of lithography process defects and increase the defect-free rate of the process.

Description

technical field [0001] The present invention relates to a method and device for interference lithography, in particular to a method and device for controlling at least two coherent light beams of a specific shape, projecting them onto a substrate to be exposed to form interference fringes of a specific area size, and then passing The method of controlling the position of the substrate to be exposed or the position of the two coherent beams of a specific shape by means of multiple step movements to form a large-area predetermined pattern on the substrate to be exposed is a step-array interference method for making periodic patterns. Method and apparatus for lithography. Background technique [0002] The principle of optical interference lithography (Interference Lithography) is to use different combinations of two or more beamlines to intersect on the substrate, which can be exposed on the substrate resist layer to produce periodic interference fringe patterns, so that sub-mi...

Claims

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Application Information

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IPC IPC(8): G03F7/20
Inventor 王伦陈永彬饶智升张所鋐张哲豪
Owner IND TECH RES INST
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