Optoelectronic products and manufacturing method thereof
A technology for optoelectronic components and optical components, applied in electrical components, manufacturing tools, electrical solid devices, etc., and can solve problems such as image sharpness loss
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[0059] The method steps for producing a composite wafer with a transparent cover for the optoelectronic circuits on the functional wafer are described with reference to FIGS. 1 to 4 . The method is based on encapsulation of optoelectronic components in a composite wafer by manufacturing a glass wafer and then mounting and fastening the glass wafer on the functional side of the functional wafer with electrical circuits on the functional wafer. In this case, the glass wafer is preferably produced with a thickness between 50 and 500 microns, and an average thickness tolerance of less than ±10 microns, preferably less than ±6 microns. In this case, the thickness of the optical glass wafer fluctuates at most ±10 microns, preferably at most ±6 microns.
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