Thermal field structure of moving thermal insulation ring for vertically oriented growth of polysilicon

A technology of vertical orientation and thermal insulation ring, which is applied in the direction of crystal growth, single crystal growth, chemical instruments and methods, etc., can solve problems such as structural design defects, and achieve the effects of improving enterprise production capacity, reasonable design, and improving safety factor

Inactive Publication Date: 2012-02-15
NINGBO JINGYUAN SOLAR ENERGY +1
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to structural design defects in the supporting thermal field of the existing polycrystalline ingot furnace, it is difficult to meet the above requirements

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Thermal field structure of moving thermal insulation ring for vertically oriented growth of polysilicon
  • Thermal field structure of moving thermal insulation ring for vertically oriented growth of polysilicon
  • Thermal field structure of moving thermal insulation ring for vertically oriented growth of polysilicon

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] The present invention will be further described below in conjunction with accompanying drawing.

[0019] The heat field structure of the moving heat insulating ring in this embodiment includes a crucible 6 placed in the furnace chamber 1, and the heat field of the crucible 6 includes a top heater 3, a side heater 5 and a heat exchange table at the bottom of the crucible 6 7, wherein the top heater 3 and the side heater 5 are fixed on the electrode 16; the furnace chamber 1 is provided with a side-enclosed heat insulation cage 4, and the crucible 6 and the thermal field are placed in the heat insulation cage In the body 4, the upper end of the heat insulation cage body 4 is connected with the lifting device 15; the top heat insulation board 2 and the lower heat insulation layer 9 are respectively arranged on the top and bottom of the heat insulation cage body 4, wherein the top heat insulation board 2 is fixed and suspended on the electrode 16, and the argon gas input Th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to the technical field of design and manufacture of a polysilicon ingot furnace, and aims to provide a thermal field structure of a moving thermal insulation ring for vertically oriented growth of polysilicon. The heat field structure includes a furnace chamber with a side-enclosed heat-insulation cage, the crucible and the heat field are placed in the heat-insulation cage, and the upper end of the heat-insulation cage is connected with the lifting device; the upper and lower sides of the heat-insulation cage The top insulation board and the lower insulation layer are respectively arranged, wherein the top insulation board is fixedly suspended on the electrode, the lower insulation layer and the heat exchange platform are fixed on the support column, the top insulation board is connected with the upper end of the heat insulation cage, and the lower The insulation layer is movably connected with the lower end of the heat insulation cage; an annular follower heat insulation ring is fixed inside the heat insulation cage through several connecting devices. The invention has a reasonable design, can increase polysilicon crystal grains, reduce grain boundaries, improve the verticality of crystal growth direction, thereby improving the quality of polysilicon ingots, and at the same time, the follower heat insulation ring also plays a role in reducing energy consumption.

Description

technical field [0001] The invention relates to the technical field of design and manufacture of a polysilicon ingot furnace, in particular to a thermal field structure of a follower insulation ring for vertically oriented growth of polysilicon. Background technique [0002] There are a large number of grain boundaries in cast polysilicon, and the clean grain boundaries are non-electrically active, which has no or only a slight impact on the minority carrier lifetime, while the segregation or precipitation of impurities will change the electrical activity of the grain boundaries, which will significantly reduce Minority carrier life, the more grain boundaries, the greater the impact; but studies have shown that if the grain boundaries are perpendicular to the device surface, the grain boundaries have little effect on the electrochemical performance of the material, so increasing the grain size and improving the growth direction are important An effective method to improve th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C30B15/14
Inventor 唐骏傅林坚沈维根石刚
Owner NINGBO JINGYUAN SOLAR ENERGY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products