Device and method for measuring damage threshold value of optical thin film irradiated by dual-wavelength laser simultaneously
A dual-wavelength laser and damage threshold technology, applied in optics, optical components, testing optical performance, etc.
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[0025] The present invention will be further described below in conjunction with the embodiments and accompanying drawings, but the protection scope of the present invention should not be limited thereby.
[0026] see first figure 1 , figure 1 It is a structural schematic diagram of Embodiment 1 of the dual-wavelength laser simultaneous irradiation optical film damage threshold measurement device of the present invention. It can be seen from the figure that the dual-wavelength laser simultaneous irradiation optical thin film damage threshold measurement device of the present invention includes an output wavelength of λ 1 The first laser 2 and the output wavelength is λ 2 The second laser 3 is used to collimate the optical path and assist in monitoring damage and destruction. The third laser 7 is a sample to be tested 28 located on a mobile platform 27, and its composition is:
[0027] On the first laser path output by the first laser 2, the first energy attenuator 8, the fir...
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