Device and method for measuring damage threshold value of optical thin film irradiated by dual-wavelength laser simultaneously

A dual-wavelength laser, damage threshold technology, used in optics, optical components, testing optical properties, etc.

Active Publication Date: 2010-08-18
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

At present, there is no measurement device and evaluation method for the damage threshold of optical thin films under simultaneous irradiation of two wavelengths of laser light at home and abroad.

Method used

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  • Device and method for measuring damage threshold value of optical thin film irradiated by dual-wavelength laser simultaneously
  • Device and method for measuring damage threshold value of optical thin film irradiated by dual-wavelength laser simultaneously
  • Device and method for measuring damage threshold value of optical thin film irradiated by dual-wavelength laser simultaneously

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Embodiment Construction

[0025] The present invention will be further described below in conjunction with the embodiments and drawings, but the protection scope of the present invention should not be limited by this.

[0026] See first figure 1 , figure 1 It is a schematic diagram of the structure of embodiment 1 of the device for measuring damage threshold of optical film simultaneously irradiated by dual-wavelength laser of the present invention. It can be seen from the figure that the device for measuring damage threshold of optical film simultaneously irradiated by dual-wavelength laser of the present invention includes an output wavelength of λ 1 The first laser 2 and the output wavelength is λ 2 The second laser 3 is used for collimating the optical path and assisting in monitoring damage and destruction. The third laser 7, a sample 28 to be tested on a mobile platform 27, is composed of:

[0027] A first energy attenuator 8, a first beam splitter 20, and a first lens 12 are sequentially arranged on ...

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Abstract

The invention relates to a device and a method for measuring a damage threshold value of an optical thin film irradiated by dual-wavelength laser simultaneously. In the measuring device, the energy and spot size of the laser with different wave lengths are controlled respectively by adopting two different groups of optical paths and the measuring device ensures the consistency of the time of the dual-wavelength laser reaching the surface of a sample to be tested by an optical path delay method. The damage threshold value of the sample to be tested which is acted by the dual-wavelength laser lambda 1 and lambda 2 simultaneously is measured by a method for fixedly selecting the energy density of the laser with a certain wave length lambda 1; and the contribution of the laser with different wave lengths to the damage of the optical thin film is judged by a threshold value difference comparison method. Through the device and the method, the damage threshold value of the optical thin film irradiated by the dual-wavelength laser simultaneously can be obtained; and the contribution of the laser with a certain wave length to the damage can be evaluated.

Description

Technical field [0001] The invention relates to the evaluation of the optical properties of optical films, in particular to a device and method for measuring damage threshold of optical films under simultaneous dual-wavelength laser irradiation. Background technique [0002] In the current international standard ISO 11254-1, there is only one wavelength laser irradiated optical film measuring device and evaluation system. The basic method is to irradiate the film with a single wavelength laser to determine the number of damage points S of the film at a certain energy density E. Generally, if 10 points are measured, the probability of damage occurrence is P=S / 10, and then change it Energy density E 1 , E 2 ...And get the corresponding damage probability P 1 , P 2 ..., the damage threshold value Φ can be obtained by adopting the damage probability P obtained by the straight line fitting and the corresponding energy density data point E. In recent years, with the development and ap...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01M11/02G02B7/02G02B5/30G02B26/08
Inventor 周明李大伟赵元安邵建达范正修
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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