Modular and readily configurable reactor enclosures and associated function modules

A technology of functional modules and reactors, applied in the direction of chemically reactive gases, chemical instruments and methods, gaseous chemical plating, etc., can solve problems such as not teaching the use of external measuring instruments in combination

Inactive Publication Date: 2011-05-04
SOITEC SA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] The inventors believe that there is nothing in the prior art that teaches how an external measuring instrument can be used in conjunction with a conventional cold wall CVD reaction chamber with a conventional heat lamp setup

Method used

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  • Modular and readily configurable reactor enclosures and associated function modules
  • Modular and readily configurable reactor enclosures and associated function modules
  • Modular and readily configurable reactor enclosures and associated function modules

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Embodiment Construction

[0039] A preferred embodiment of the modular, reconfigurable reactor enclosure of the present invention is now described. Before doing so, however, a brief description of conventional prior art reactor housings is provided.

[0040] Figure 1 (Prior Art) shows a schematic plan view of relevant aspects of a conventional prior art reactor enclosure, which is presented for illustrative purposes only and is not necessarily any particular prior art reactor enclosure or any particular Technically accurate representation of a prior art reaction chamber. A reactor housing or housing 101 supports and holds a CVD reaction chamber 103, which is typically made of clear quartz and contains commonly used components such as a susceptor 105 for holding a semiconductor wafer (epitaxial layer) and for raising Susceptor Control Board 107 for temperature stability of the susceptor. Process gases enter the reaction chamber 103 through one or more gas inlets 109 configured to produce the desired g...

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Abstract

The invention provides an improved CVD reactor sub-system including a modular reactor enclosure and function modules. The modular reactor enclosure can accommodate a commercially available cold-wall CVD reactor chamber, and the function modules can be arranged on the reactor enclosure to provide functions necessary to perform a CVD process with the reactor chamber. Preferred function modules include modules for providing heat to a CVD reactor chamber and modules for measuring conditions internal to a CVD reactor chamber. The invention also provides methods for configuring such a CVD reactor sub-system, in particular configuring the sub-system to best perform a particular CVD process, and kits for performing such configuring. Advantageously, the invention allows a single CVD reactor sub-system to be reconfigured and rearranged so that it can best perform a number of different CVD processes.

Description

technical field [0001] The present invention relates to the field of materials processing systems, and in particular to chemical vapor deposition (CVD) systems, and provides a modular CVD reactor enclosure that is readily reconfigurable to suit individual CVD processes including allowing for Special needs including external monitoring of conditions. Background technique [0002] Chemical vapor deposition (CVD) processing is commonly used in the semiconductor field, for example for growing and processing wafers of semiconductor material. The CVD process is performed in a CVD reactor chamber, which is designed to withstand the high temperatures and corrosive atmospheres that are often present. [0003] CVD chambers for semiconductor processing are typically configured such that process gases enter from above and flow vertically downward toward the growth wafer (see e.g. US 6,167,834), or that process gases enter from the side of the chamber and flow horizontally through the g...

Claims

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Application Information

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Patent Type & AuthorityApplications(China)
IPC IPC(8): H01L21/205
CPCC23C16/44C23C16/481H01L21/67115H01L21/67248C30B25/08
InventorR·T·小贝尔特拉姆
OwnerSOITEC SA