Etching apparatus and method of applying same in etching substrate
An etching device and substrate technology, which is applied in chemical/electrolytic methods to remove conductive materials, electrical components, printed circuit manufacturing, etc., can solve the problems of insufficient etching, disconnection, and excessive etching of conductive lines
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0052] The etching device and substrate etching method provided by the technical solution will be further described in detail below with reference to the accompanying drawings and embodiments.
[0053] Please also refer to figure 1 and figure 2 , the etching device 10 provided in the embodiment of the technical solution is used to etch a substrate to form a circuit. The etching device 10 includes an etching tank 100 , a conveying mechanism 12 , a spraying mechanism 14 , a liquid suction mechanism 16 and a controller 18 . The etching tank 100 is used to store etching solution, which is located under the conveying mechanism 12 and communicated with the spraying mechanism 14 .
[0054]The conveying mechanism 12 includes an upper conveying roller set 122 , a lower conveying roller set 124 , an upper auxiliary roller set 126 and a lower auxiliary roller set 128 . The upper conveying roller set 122 is opposite to the lower conveying roller set 124 , and is used for conveying the...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 