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Multilayer dielectric film cut-off filter combination device

A cut-off filter, multi-layer medium technology, applied in the field of optical filters

Active Publication Date: 2017-03-15
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

As far as we know, so far no one has designed a multilayer dielectric film cut-off filter for the optical path of the spatial filter to achieve the angular spectrum selection characteristic.

Method used

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  • Multilayer dielectric film cut-off filter combination device
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  • Multilayer dielectric film cut-off filter combination device

Examples

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Embodiment Construction

[0019] The specific implementation process of the present invention will be described below with a specific example of a multilayer dielectric film cut-off filter with a center wavelength of 1053 nm. But this should not limit the protection scope of the present invention.

[0020] See first figure 1 , figure 1 It is a schematic cross-sectional view of Embodiment 1 of the multilayer dielectric film cut-off filter combination device of the present invention. It can be seen from the figure that the multilayer dielectric film cut-off filter combination device of the present invention includes a reflector 1, a short-wave pass cut-off filter 2, and The long-wave pass cut-off filter 3, the reflector 1 is placed vertically, the short-wave pass cut-off filter 2 and the long-wave pass cut-off filter 3 are placed in parallel and form an angle with the normal of the reflector 1 θ=45°.

[0021] The short-wave pass cut-off filter 2 and the long-wave pass cut-off filter 3 are placed obliquely 45...

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Abstract

The invention discloses a combined multilayer dielectric film cut-off filter device, which comprises a planar mirror, a short-wavelength pass cut-off filter and a long-wavelength pass cut-off filter, wherein the mirror is perpendicularly arranged; the short-wavelength pass cut-off filter and the long-wavelength pass cut-off filter are parallel, and form angles Theta with the normal of the mirror; each of the short-wavelength pass cut-off filter and the long-wavelength pass cut-off filter consists of a multilayer dielectric film cut-off filter. The angular spectrum selectivity of the combined multilayer dielectric film cut-off filter device reaches a submillimeter radian.

Description

Technical field [0001] The invention relates to a filter, in particular to a multilayer dielectric film cut-off filter combination device used under oblique incident conditions. Background technique [0002] The laser has the characteristics of good monochromaticity, good coherence, good directionality and high brightness, and has become a bright pearl in natural science. High-power lasers have been widely used in spectroscopy and optical measurement, and have become an important means of medical and health research and clinical diagnosis; they have significant application potential in military technology, industrial production, and daily life. The development of laser devices is inseparable from optical devices. With the continuous development of high-power laser systems, higher requirements are placed on the spectral performance and angular spectrum selectivity of optical devices. [0003] In high-power systems, the multilayer dielectric film narrowband separation filter is one ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/20G02B1/10
Inventor 章瑛齐红基易葵邵建达
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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