Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A special cultivation substrate for orchid cultivation

A cultivation medium and orchid technology, applied in the field of crop cultivation, can solve the problems of low survival rate of orchids, rotten roots, etc., and achieve the effect of high survival rate of orchids, rich nutrition, and less pests and diseases

Active Publication Date: 2016-01-20
徐州博创建设发展集团有限公司
View PDF4 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When the existing cultivation base is used to cultivate orchids, root rot often occurs, resulting in a low survival rate of orchids

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0011] A special cultivation medium for orchid cultivation, which is made by mixing the following component materials in weight (kg): laterite brick gravel particles with a volume of 0.1-0.2 cubic centimeters 40, fairy soil 30, self-made fire soil 30, the three materials After mixing evenly,

[0012] Among them, the production method of lateritic brick gravel: smash the discarded lateritic bricks used in construction, soak them in 1% citric acid solution in water for 10 days, then take them out and rinse them clean, and the volume of sieve out is 0.1-0.2 cubic Centimeter-sized particles, and then put the screened broken brick particles into the nutrient solution to soak for 6-7 days, remove and drain, and then set aside;

[0013] Among them, the nutrient solution contains the following raw materials per liter: boric acid 2g, tea saponin 0.2g, urea 3g, alginic acid 1g, vitamin C 0.2g, Sophora flavescens water extract 0.2g, aloe vera water extract 0.2g, salicylic acid Sodium ch...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a cultivation medium special for orchid cultivation. The cultivation medium special for orchid cultivation is formed by mixing constituent materials, by weight, 35-45 parts of red soil brick broken stone particles with the volume of 0.1-0.2 cubic centimeter, 25-35 parts of natural soil and 25-35 parts of self-made burned soil. The three materials are mixed uniformly and then the cultivation medium is obtained. The cultivation medium special for orchid cultivation has the advantages of being ventilating, spongy, good in water leakage and rich in nutrition, contains multiple microelements required by orchids, has a bactericidal effect and is especially suitable for orchid cultivation.

Description

technical field [0001] The invention relates to the field of crop cultivation, in particular to a special cultivation substrate for orchid cultivation. Background technique [0002] Orchids originally grew in wild forests in deep mountains, in shady, ventilated, and water-free mountainous areas. Therefore, in order to grow orchids healthily, the cultivation substrate is required to have the characteristics of ventilation, softness, and good water leakage. When the existing cultivation base is used for cultivating orchids, the phenomenon of root rot often occurs, resulting in a low survival rate of orchids. The present inventor has been cultivating orchids for nearly 20 years, and after many years of exploration, he has found a special cultivation medium for better orchid cultivation. Contents of the invention [0003] The invention provides a special cultivation substrate for orchid cultivation. The cultivation substrate has ventilation, softness, good water leakage, ric...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): A01G31/00
Inventor 何爱华
Owner 徐州博创建设发展集团有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com