Substrate processing apparatus and substrate processing method
A technology of a substrate processing device and a substrate processing method, which is applied in the direction of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., and can solve the problems of substrate processing devices becoming larger
Active Publication Date: 2016-10-05
DAINIPPON SCREEN MTG CO LTD
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Problems solved by technology
However, such a mechanism requires a space for the door to pass through as the upper opening is opened and closed, which actually increases the size of the substrate processing apparatus.
Method used
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[0025] figure 1 It is a figure showing the internal structure of the substrate processing apparatus 1, figure 2 It is a perspective view showing a partial appearance of the substrate processing apparatus 1 . The substrate processing apparatus 1 is a so-called batch type apparatus, and processes a plurality of disc-shaped silicon substrates 9 (hereinafter, simply referred to as "substrates 9") collectively with a processing liquid such as pure water or hydrofluoric acid (HF). deal with. exist figure 1 as well as figure 2 Here, let two horizontal directions perpendicular to each other be the X direction and the Y direction, and let the vertical direction (gravity direction) perpendicular to the X direction and the Y direction be the Z direction.
[0026] The substrate processing apparatus 1 has: a processing tank 3, which accommodates a plurality of substrates 9 inside, stores a predetermined processing liquid, and has an upper opening 30; a support part 4, which is used t...
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This substrate processing device (1) has a processing tank (3), a cover (5), and a raising / lowering unit. The processing tank, which stores a processing liquid, has a top opening (30). The cover comprises a pair of rolls (51, 52) around which both ends of a sheet-form continuous member (50) are wound. The center portion (501), being the part of the continuous member between the pair of rolls, is arranged near the top opening and in parallel to the opening plane of the top opening, and by rotating the rolls, the center portion moves along the opening plane. A passage hole (502) which is an opening is formed in the continuous member. The raising / lowering unit raises and lowers the substrate (9) between a processing position inside the processing tank and a retracted position outside of the processing tank. When raising and lowering the substrate between the processing position and the retracted position, the passage hole is positioned directly above the top opening. Further, when processing the substrate inside the processing tank, the passage hole is positioned in a position not directly above the top opening and the top opening is closed by the continuous member. Thus, the substrate processing device can be miniaturized by means of a space-saving cover.
Description
technical field [0001] The present invention relates to a substrate processing device and a substrate processing method for processing a substrate. Background technique [0002] Conventionally, a substrate processing apparatus for processing a substrate with a processing liquid such as pure water or a chemical solution has been used. For example, in the substrate processing apparatus of Japanese Patent Application Laid-Open No. 2001-135710, a plurality of substrates in an upright state arranged parallel to each other are arranged on In the processing tank, a plurality of substrates are collectively processed with the processing liquid. [0003] In addition, Japanese Patent Application Laid-Open No. 2000-150609 discloses a substrate loading and unloading device. The substrate loading and unloading device has: a loading unit on which a container for accommodating a substrate is placed; a transfer unit that transfers a substrate from the container. . The loading unit has a pl...
Claims
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IPC IPC(8): H01L21/304H01L21/306
CPCH01L21/67057H01L21/67086
Inventor 相原友明光吉一郎前川直嗣土谷庆一
Owner DAINIPPON SCREEN MTG CO LTD