A Position Synchronization Method for Defect Detection and Observation Equipment
A defect detection and equipment technology, which is applied in semiconductor/solid-state device testing/measurement, material analysis by measuring secondary emissions, electrical components, etc., can solve problems such as lack of effective synchronization methods, and achieve the goal of avoiding the failure of automatic observation Effect
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[0026] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments. Obviously, the described examples are only some examples of the present invention, not all examples. Based on the examples summarized in the present invention, all examples obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0027] It should be noted that, in the case of no conflict, the examples in the present invention and the features in the examples can be freely combined with each other.
[0028] An example of the present invention will be explained in detail below in conjunction with the accompanying drawings.
[0029] The example of the present invention is applied to the detection and observation of wafer defects, and the defect detection and observation equipment includes defect detection equipment and defect observation equipment, wherein the method ...
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