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A Negative Process-free Lithographic Plate

A process-free, lithographic printing technology, applied to the photoplate-making process of the patterned surface, photosensitive materials used in optical mechanical equipment, instruments, etc., can solve the problems of insufficient printing resistance, and achieve improved printing resistance and strong adsorption Function, the effect of preventing particle aggregation

Active Publication Date: 2019-11-05
LUCKY HUAGUANG GRAPHICS +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this method achieves a better balance between on-press developing performance and fountain solution contamination, and improves the printing durability to a certain extent, compared with the requirements of long printing runs, the printing durability is still far from enough

Method used

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  • A Negative Process-free Lithographic Plate
  • A Negative Process-free Lithographic Plate
  • A Negative Process-free Lithographic Plate

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1

[0063] Add 100 grams of IPDI, 7.6 grams of 50nm diameter nano SiO 2 (Hydroxyl value 1.9mmol / g) and 1g of dibutyltin dilaurate catalyst were added to a 500mL four-necked flask with thermometer, stirrer and nitrogen introduction device, 2 Under protection, the reaction was stirred at 60℃ for 8 hours, and the chemical titration method was used to determine the -NCO content no longer decreased. 220g PPG was added, and the temperature reaction was kept to reduce the one NCO content to 45%. 51.4g HEA was added and measured by infrared spectroscopy. The 2235cm-NCO characteristic absorption peak disappears completely. Get about 380.0 grams of SiO 2 / Polyurethane acrylic prepolymer B1.

Synthetic example 2

[0065] Add 100 grams of IPDI and 19.0 grams of nano-SiO with a diameter of 10 nm 2 And 1g of dibutyltin dilaurate catalyst were added to a 500mL four-necked flask equipped with a thermometer, agitator and nitrogen introduction device, in the N 2 Under protection, the reaction was stirred at 60℃ for 8h, and the chemical titration method was used to determine the -NCO content no longer decreased. 216.0g PPG was added, and the temperature reaction was kept to reduce the one NCO content to 45%. 50.0g HEA was added and measured by infrared spectroscopy. The 2235cm-NCO characteristic absorption peak disappears completely. Get about 385.0 g SiO 2 / Polyurethane acrylic prepolymer B2.

Synthetic example 3

[0067] Add 100 grams of IPDI, 1.9 grams of nano SiO with a diameter of 100 nm 2 (Hydroxyl value 1.9mmol / g) and 1g of dibutyltin dilaurate catalyst were added to a 500mL four-necked flask with thermometer, stirrer and nitrogen introduction device, 2 Under protection, the reaction was stirred at 60℃ for 8 hours, and the chemical titration method was used to determine -NCO content no longer decreased. Add 224 grams of PPG, keep the temperature reaction to reduce the content of one NCO to 45%, add 52 grams of HEA, and measure by infrared spectroscopy The 2235cm-NCO characteristic absorption peak disappears completely. Get about 378.0 g SiO 2 / Polyurethane acrylic prepolymer B2.

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PUM

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Abstract

The invention provides a negative image treatment-free lithograph plate. The lithograph plate comprises a base, an imaging layer on the base and a protective layer on the imaging layer, wherein the imaging layer includes a polymer binder, an initiation system capable of initiating polymerization / cross-linking during imaging exposure and polymerisable / cross-linkable components, and the polymerisable / cross-linkable components comprise nanometer SiO2 / polyurethane acrylate prepolymer. The treatment-free lithograph plate can be directly installed on a printing machine for printing without developing after infrared laser scanning exposure. With the treatment-free lithograph plate and a printing method provided by the invention, the disadvantage of insufficient pressrun of treatment-free lithograph plates prepared by other methods is overcome, high pressrun is realized while high quality dots are guaranteed, and the number of transferring paper in starting of a machine is reduced.

Description

Technical field [0001] The invention relates to a lithographic printing plate premise and a printing method, in particular to a negative image processing-free lithographic printing plate and a printing method of the processing-free lithographic printing plate on a printing machine. Background technique [0002] The preparation process of lithographic plates in the printing industry is well known to those in the industry. The plate making process of the lithographic printing plate requires at least two steps to complete. One is to expose the printing plate coated with the photosensitive composition through a mask (such as a positive and negative mask) under a specific light source, thereby forming A latent image of a light image; the second is to carry out a so-called follow-up development step on the exposed printing plate, through which the excess coating is removed. The pre-coated photosensitive lithographic plate is a sheet-like material with aluminum or polyester as a suppor...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/09G03F7/004G03F7/033
Inventor 杨青海张刚宋小伟吴兆阳黄文明刘东黎吴俊君刘红来
Owner LUCKY HUAGUANG GRAPHICS