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Mask for evaluation, evaluation method, exposure apparatus, and manufacturing method of article

A technology of exposure device and mask, which is applied in the direction of the original photomechanical processing, the photoplate making process of the pattern surface, optics, etc., and can solve different and unrealistic problems

Active Publication Date: 2019-11-01
CANON KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the influence due to the decrease in developing power differs depending on the adjustment state of the developing device, so it is not practical to manufacture a mask for evaluation by confirming the influence when setting up the exposure device.

Method used

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  • Mask for evaluation, evaluation method, exposure apparatus, and manufacturing method of article
  • Mask for evaluation, evaluation method, exposure apparatus, and manufacturing method of article
  • Mask for evaluation, evaluation method, exposure apparatus, and manufacturing method of article

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Embodiment Construction

[0021] Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. In addition, in each figure, the same reference numerals are attached to the same components, and overlapping descriptions are omitted.

[0022] figure 1 It is a schematic diagram showing the structure of the exposure apparatus 100 which is one aspect of the present invention. The exposure apparatus 100 is a lithography apparatus that transfers a pattern of a mask to a substrate, that is, exposes the substrate. The exposure apparatus 100 has a mask stage 2 , an illumination optical system 3 , a projection optical system 4 , a substrate stage 6 , and a control unit 7 .

[0023] The mask stage 2 holds a mask 1 having a pattern to be transferred to the substrate 5 and an evaluation mask 10 for evaluating the performance of the exposure apparatus 100 in an exchangeable manner. The illumination optical system 3 illuminates the mask 1 held on the mask stage 2 and t...

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PUM

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Abstract

The invention relates to a mask for evaluation, an evaluating method, an exposure apparatus and a method of manufacturing artical. The mask is used for evaluating the performance of the exposure appratus for exposuring a substrate, and the mask is characterized in that: the mask comprises a first pattern, a second pattern and a dummy pattern, wherein the first pattern and the second pattern can evaluate a first performance of the exposure apparatus, the dummy pattern is used for making a difference between a first proportion and a second proportion is within +-10%, the first proportion includes the opening part and shielding part of per unit area in a first area of the first pattern, and the second proportion includes the opening part and shielding part of per unit area in a second area of the second pattern.

Description

technical field [0001] The present invention relates to an evaluation mask used when evaluating the performance of an exposure apparatus, an evaluation method, an exposure apparatus, and a method for manufacturing an article. Background technique [0002] The exposure device projects (images) a pattern of a mask or a reticle onto a substrate (semiconductor wafer, glass plate) coated with a photosensitive agent such as a resist via a projection optical system, and transfers the pattern onto the substrate. In recent years, a scanning type exposure apparatus, a so-called step-and-scan exposure apparatus, has become mainstream. This scanning type exposure apparatus illuminates a part of the mask and scans the mask and the substrate for the projection optical system. Substrate exposure. [0003] In recent years, along with miniaturization of equipment, higher performance of exposure apparatuses has been demanded, so it is necessary to evaluate the performance of exposure apparat...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/44
CPCG03F1/00
Inventor 安藤美和子
Owner CANON KK