Micro-Nano Electrochemical Deposition Processing Method Based on Droplet Taylor Cone

Abstract

The invention relates to a micro-nano electrochemical deposition machining method based on a liquid drop Taylor cone, and belongs to the technical field of micro-nano manufacturing. The method comprises the steps that liquid drops containing deposited metal ions are firstly put between a metal probe and a workpiece, and the materials of the probe are deposited materials; the probe and the workpiece are both immersed in an insulating medium, and the insulating medium and water are not compatible; the probe and the workpiece are connected with the positive pole and the negative pole of a direct-current power source respectively; the liquid drops do reciprocating motion between the probe and the workpiece under the action of an electric field; and when the liquid drops are close to the probe and the workpiece, the Taylor cone is formed on the surfaces of the liquid drops under the action of the electric field, by means of the electrochemical action generated during contact of the liquid drop Taylor cone, the probe and the workpiece, metal atoms of the metal probe are changed into metal cations to enter the liquid drops, then the metal cations are carried by the liquid drops to the surface of the workpiece and conveyed to the surface of the workpiece through the liquid drop Taylor cone, the metal cations obtain electrons on the surface of the workpiece to be changed into atoms to be deposited, and therefore micro-nano electrochemical deposition machining is achieved.

Description

technical field [0001] The invention belongs to the technical field of micro-nano manufacturing, and relates to a micro-nano electrochemical deposition processing method based on a droplet Taylor cone. Background technique [0002] The in-depth development of nanotechnology puts forward higher and higher requirements for nanomanufacturing technology. Traditional nano-manufacturing technology can be divided into mask processing technology and maskless processing technology. LIGA (Lithographie, Galanoformung and Abformung) is a typical mask processing technology, which is a microfabrication technology based on electrochemical and photolithography technology. The processing accuracy of mask processing technology depends to a large extent on the accuracy of photolithography. The current lithography technologies mainly include excimer lithography, extreme ultraviolet lithography, electron beam lithography, ion beam exposure, X-ray lithography and nanoimprint lithography. [00...

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Problems solved by technology

Although this technology can achieve atomic-level precision, it is demanding on equipment and operating conditions

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