Whitening mask lotion suitable for sensitive skins and preparation method thereof

A whitening mask, sensitive technology, applied in the field of daily chemicals, to improve skin quality, reduce the number of skin allergies, and strengthen the tissue

Inactive Publication Date: 2016-07-20
覃政强
View PDF0 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, there is no whitening mask water suitable for people with allergic skin on the market.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] A whitening mask water suitable for allergic skin, the main raw materials of the mask water include the following substances by weight: 10g of chamomile, 15g of Angelica dahurica, 20g of citrus aurantium, 15g of black plum, 10g of schisandra, 5g of cicada slough, 3g of Pulsatilla chinensis, 8g of jade hibiscus , white fresh skin 5g, Chonglou 2g, Kochia scoparia 6g, purified water 180g. Its preparation method specifically comprises the following steps:

[0034] (1) Select Angelica dahurica, white fresh skin, citrus citrus, black plum, Kochia chinensis, Schisandra chinensis, and cicada slough according to the above weight parts, put them into clear water and wash them, remove impurities, and cut Angelica dahurica and white fresh skin into lengths within 1cm. In a short section, remove the seeds of Citrus aurantium and ebony; mix Kochia chinensis, Schisandra chinensis, and cicada slough with the cut Angelica dahurica, white fresh skin, and seeded citrus aurantium and ebony...

Embodiment 2

[0040] A whitening mask water suitable for allergic skin, the main raw materials of the mask water include the following substances by weight: 15g of chamomile, 20g of Angelica dahurica, 25g of citrus aurantium, 20g of black plum, 20g of Schisandra chinensis, 8g of cicada slough, 7g of Xing'an Pulsatilla, 12g of Jade Hibiscus , 10g of white fresh skin, 5g of Chonglou, 9g of Kochia scoparia, 230g of purified water. Its preparation method specifically comprises the following steps:

[0041] (1) Select Angelica dahurica, white fresh skin, citrus citrus, black plum, Kochia chinensis, Schisandra chinensis, and cicada slough according to the above weight parts, put them into clear water and wash them, remove impurities, and cut Angelica dahurica and white fresh skin into lengths within 1cm. In a short section, remove the seeds of Citrus aurantium and ebony; mix Kochia chinensis, Schisandra chinensis, and cicada slough with the cut Angelica dahurica, white fresh skin, and seeded citr...

Embodiment 3

[0047] A whitening facial mask water suitable for allergic skin. The main raw materials of the facial mask water include the following substances by weight: 11g of chamomile, 16g of Angelica dahurica, 21g of Citrus aurantium, 17g of black plum, 12g of Schisandra chinensis, 6g of cicada slough, 4g of Xing'an Pulsatilla, 9g of Jade Hibiscus , white fresh skin 6g, Chonglou 3g, Kochia scoparia 7g, purified water 190g. Its preparation method specifically comprises the following steps:

[0048] (1) Select Angelica dahurica, white fresh skin, citrus citrus, black plum, Kochia chinensis, Schisandra chinensis, and cicada slough according to the above weight parts, put them into clear water and wash them, remove impurities, and cut Angelica dahurica and white fresh skin into lengths within 1cm. In a short section, remove the seeds of Citrus aurantium and ebony; mix Kochia chinensis, Schisandra chinensis, and cicada slough with the cut Angelica dahurica, white fresh skin, and seeded citr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a whitening mask lotion suitable for sensitive skins and a preparation method thereof, belonging to the field of daily chemicals. The whitening mask lotion specifically comprises the following raw materials: 10-15 parts of chamomile, 15-20 parts of dahurian angelica root, 20-25 parts of immature bitter orange, 15-20 parts of dark plum fruit, 10-20 parts of Chinese magnoliavine fruit, 5-8 parts of cicada slough, 3-7 parts of pulsatilla dahurica, 8-12 parts of coagulum of cholla juice, 5-10 parts of root-bark of densefruit pittany, 2-5 parts of rhizome of manyleaf Paris, 6-9 parts of belvedere fruit and 180-230 parts of purified water. The mask lotion provided by the invention has the beneficial effects that the main raw materials of the mask lotion are healthy, natural, safe and reliable and have mild and non-irritant components; through synergy, the components have the functions of whitening, relieving and tranquilizing; the skin allergy frequency can be reduced, the antiallergic, antibacterial and anti-dust mite capabilities of skins can be improved and the skins are gradually recuperated by using the mask lotion for a long term.

Description

【Technical field】 [0001] The invention relates to the field of daily chemicals, in particular to a whitening mask water suitable for sensitive skin and a preparation method thereof 【technical background】 [0002] Allergic skin refers to a highly intolerant skin state that is susceptible to various stimuli and produces various subjective symptoms such as tingling, tightness, and itching. As we grow older, the weakly acidic sebum film on the surface of the skin gradually becomes thinner, making it easier for some irritating substances to invade the skin, leading to problems such as pigmentation in the skin, increased red blood, or scarring acne marks. At present, under the environment of serious air pollution and intensified domestic industrial development, more and more problems such as ultraviolet radiation, rapid growth of bacteria, and smog have caused more than 70% of the population in my country to have sensitive skin. [0003] In daily life, mask is a daily skin care p...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/98A61K8/97A61Q19/00A61Q19/02A61Q17/00
CPCA61K8/97A61K8/987A61K2800/75A61Q17/005A61Q19/00A61Q19/005A61Q19/02
Inventor 覃政强
Owner 覃政强
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap