Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

cranial orthosis

An orthosis and head technology, applied in the direction of medical science, etc., can solve the problems of unsatisfactory orthopedic effect and the inability of the head to move freely.

Inactive Publication Date: 2017-10-13
和炜方
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The purpose of the present invention is to provide a cranial orthosis to solve the technical problems in the prior art that the infant's skull cannot move freely and the orthopedic effect is not ideal during the infant's cranial orthopedic process.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • cranial orthosis
  • cranial orthosis
  • cranial orthosis

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] This embodiment is a cranial orthosis, such as figure 1As shown, it includes a base 1, the lower surface of the base 1 is an arc support surface 11 in contact with the rest surface, the upper surface of the base 1 is an inner occipital surface 12 for accommodating and supporting the skull 2 ​​of an infant, and the inner occipital surface 12 It includes a skull supporting surface that at least partially matches the shape of a normal infant's skull; the infant's skull 2 ​​is placed in the inner occipital surface 12, and the base 1 and the infant's skull 2 ​​are adapted to the tumbler stable structure as a whole.

[0043] In this cranial orthosis, the circular arc support surface 11 of the base 1 is in contact with the resting surface, and the infant's head 2 is placed in the inner occipital surface 12 of the base 1. The pillow surface 12 exerts an active force, which can make the base 1 roll autonomously on the resting surface along with its arc supporting surface 11, and...

Embodiment 2

[0058] This embodiment is also a cranial orthosis, and its structure and working principle are basically the same as the cranial orthosis in the first embodiment above, and the differences are as follows.

[0059] In this example, if figure 2 and image 3 As shown, the inner pillow surface 12 is fixed with a plurality of strip-shaped pillow bags 121 arranged in sequence along the bending direction of the U-shaped surface and adjacent to each other. Each strip-shaped pillow bag 121 is filled with non-toxic spherical particles.

[0060] The back of the infant's skull 2 ​​acts on the non-toxic spherical particles in the strip pillow bag 121 through the self-gravity of the infant's skull 2, and the different shapes of the deformed parts of the infant's skull 2 ​​will be non-toxic to the strip pillow bag 121. The extrusion force produced by spherical particles is different. Among them, the extruding force of the protruding deformity on the non-toxic sphere particles is large, th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a head orthotic device, and relates to the technical field of a medical orthotic device. The head orthotic device is designed by solving the technical problems that in the orthotic or prevention process of the monstrous head of an infant, the head of the infant can freely move, and the orthotic effect is not ideal. The head orthotic device comprises a base, wherein the lower surface of the base is a circular arc support surface in contact with the placement surface; the upper surface of the base is an inner pillowing surface used for containing and supporting the head of the infant; the inner pillowing surface comprises a head support surface which is at least partially anastomotic with the head of the normal infant; the head of the infant is placed in the inner pillowing surface; the base and the head of the infant are used as a whole for adapting to a tumbler stable structure. The head orthotic device is used for orthotic treatment or prevention on the monstrous head of the infant.

Description

technical field [0001] The invention relates to the technical field of medical orthopedic devices, in particular to a head orthosis. Background technique [0002] There is a certain distance between the skulls of the newborn babies who are about to be born or the skulls of newborn babies. This interval allows the skulls to overlap, so that the brain tissue will not be damaged even if the baby's head is squeezed when the baby is born, and it can also meet the needs of the early stage of the newborn baby. The need for rapid growth and increased volume of brain tissue. The cranial sutures (also known as fibrous connection bands) are used to fill the gaps between the skull bones and connect the skulls to each other. The cranial sutures have good toughness and elasticity to meet the rapid growth of brain tissue in infants and young children during the first few months of life. Sometime between the ages of 1 and 3, the infant's skull fuses with the bones of the skull and maintain...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): A61F5/01
CPCA61F5/0104
Inventor 和炜方
Owner 和炜方
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com