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Abnormality Measuring Method And Abnormality Measuring Apparatus

An abnormal evaluation and equipment technology, applied in measurement devices, instruments, semiconductor working life testing and other directions, can solve the problem of not being able to clearly reflect the actual state of the semiconductor machine, unable to accurately show the real performance of the semiconductor machine, etc., to achieve accurate The effect of health trends

Active Publication Date: 2017-10-03
IND TECH RES INST
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Problems solved by technology

[0004] The present invention is to provide an abnormality evaluation method and an abnormality evaluation device for equipment, so as to solve the problem that the actual state of the semiconductor machine cannot be clearly reflected in the existing method, and to overcome the problem that the existing method only evaluates through a single feature and cannot The problem of accurately presenting the real performance of semiconductor machines

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[0045] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0046] figure 1 It is a block diagram of an abnormality assessment device 100 of equipment according to an embodiment of the present invention. Such as figure 1 As shown, the abnormality assessment device 100 includes a feature extraction module 110 , a life section analysis module 120 , a trend analysis module 130 and an alert module 140 . The life segment analysis module 120 is coupled to the feature extraction module 110 . The trend analysis module 130 is coupled to the feature extraction module 110 and the life segment analysis module 120 . The alert module 140 is coupled to the trend analysis module 130 . The feature extraction module 110 , the life section analysis module 120 , the trend analysis module 130 and ...

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Abstract

An abnormality measuring method and an abnormality measuring apparatus of equipment are provided. The abnormality measuring method includes the following steps: acquiring a feature sequence corresponding to a life cycle according to recipe information and sensing information, wherein the feature sequence includes a plurality of feature subset sequences, and the life cycle is relative to a plurality of process runs; performing repeatedly a life segment analyzing process to acquire a plurality of life segments of the life cycle and each of the plurality of the feature subset sequences corresponding to one of the plurality of life segments; building a corresponding trending distribution of each of the plurality of life segments according to a corresponding feature subset sequence of the life segment; and determining whether to send an alarm message according to a plurality of trending distributions.

Description

technical field [0001] The invention relates to an abnormal evaluation method and an abnormal evaluation device for equipment. Background technique [0002] In the traditional evaluation method of the abnormal state (such as failure or aging) of the semiconductor machine, often only one of the two can be judged as a healthy state or an abnormal state. However, such dichotomies cannot clearly reflect the actual state of semiconductor tools. [0003] In addition, in another traditional evaluation method for the state of abnormality (such as failure or aging) of the semiconductor equipment, the aging trend of the parts of the semiconductor equipment during the entire life cycle is usually measured only by a single feature. However, in fact, as the life state of the parts changes, the characteristics reflecting the aging of the parts will be different, so a single characteristic cannot accurately reflect the actual performance of the semiconductor machine. Contents of the inv...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F17/50
CPCG06F30/367G01R31/2642G01R31/2601G08B21/18Y02P90/30
Inventor 许耀中张森嘉谢宗融
Owner IND TECH RES INST
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