GaAs-based LED (light emitting diode) flip chip and preparation method thereof and LED display device
A LED chip and flip-chip technology, applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of low product yield, achieve the effect of improving product yield, reducing air bubbles, and stable bonding
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Embodiment 1
[0040] Such as figure 1 As shown, the present invention provides a method for preparing a GaAs-based flip-chip LED chip. The preparation method includes the following steps S1 to S7:
[0041] S1. Prepare the epitaxial wafer of GaAs-based flip-chip LED chip; wherein, the epitaxial wafer includes GaAs substrate, AlGaAs buffer layer, GaInP corrosion stop layer, N-GaAs layer, quantum well layer, P-GaAs layer and P-GaP ohmic contact layer.
[0042] Wherein, the N-GaAs layer provides electrons, the quantum well layer is a light-emitting layer, and the P-GaAs layer provides a hole layer.
[0043] S2. Prepare a metal contact layer on the upper surface of the P-GaP ohmic contact layer.
[0044] Wherein, the metal contact layer is used for the ohmic contact layer with the P-GaP. Such as figure 2 As shown, it is a schematic diagram of the epitaxial wafer and the metal contact layer prepared through step S1 and step S2. The metal contact layer is a p-electrode layer, which can be ob...
Embodiment 2
[0064] Such as Figure 4 As shown, this embodiment provides a GaAs-based flip-chip LED chip. The GaAs-based flip-chip LED chip is prepared by the method for preparing the GaAs-based flip-chip LED chip described in Example 1. The GaAs-based flip-chip LED chip include:
[0065] A plurality of array structures and a bonding layer, a reflective layer, and a substrate sequentially arranged on the plurality of array structures; wherein:
[0066] The initial structure includes an epitaxial wafer and a metal contact layer on the upper surface of the epitaxial wafer;
[0067] The epitaxial wafer sequentially includes a GaAs substrate, an AlGaAs buffer layer, a GaInP corrosion stop layer, an N-GaAs layer, a quantum well layer, a P-GaAs layer, and a P-GaP ohmic contact layer from bottom to top;
[0068] The cutting line is formed by sequentially performing wet etching, chemical wet etching and ultrasonic vibration on the initial structure;
[0069] The wet etching is used to etch from...
Embodiment 3
[0080] This embodiment provides an LED display device, which includes the GaAs-based flip-chip LED chip described in Embodiment 2.
[0081] The LED display device in this embodiment can improve the product yield because the GaAs-based flip-chip LED chip described in Embodiment 2 is used.
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