GaAs-based LED (light emitting diode) flip chip and preparation method thereof and LED display device

A LED chip and flip-chip technology, applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of low product yield, achieve the effect of improving product yield, reducing air bubbles, and stable bonding

Inactive Publication Date: 2017-12-26
SHANXI FEIHONG MICRO NANO PHOTOELECTRONICS SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In order to solve the technical problem of relatively low product yield when cutting GaAs-based flip-chip LED chips with a diamond knife, the present invention provides a GaAs-based flip-chip LED chip, a preparation method thereof, and an LED display device

Method used

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  • GaAs-based LED (light emitting diode) flip chip and preparation method thereof and LED display device
  • GaAs-based LED (light emitting diode) flip chip and preparation method thereof and LED display device
  • GaAs-based LED (light emitting diode) flip chip and preparation method thereof and LED display device

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Embodiment 1

[0040] Such as figure 1 As shown, the present invention provides a method for preparing a GaAs-based flip-chip LED chip. The preparation method includes the following steps S1 to S7:

[0041] S1. Prepare the epitaxial wafer of GaAs-based flip-chip LED chip; wherein, the epitaxial wafer includes GaAs substrate, AlGaAs buffer layer, GaInP corrosion stop layer, N-GaAs layer, quantum well layer, P-GaAs layer and P-GaP ohmic contact layer.

[0042] Wherein, the N-GaAs layer provides electrons, the quantum well layer is a light-emitting layer, and the P-GaAs layer provides a hole layer.

[0043] S2. Prepare a metal contact layer on the upper surface of the P-GaP ohmic contact layer.

[0044] Wherein, the metal contact layer is used for the ohmic contact layer with the P-GaP. Such as figure 2 As shown, it is a schematic diagram of the epitaxial wafer and the metal contact layer prepared through step S1 and step S2. The metal contact layer is a p-electrode layer, which can be ob...

Embodiment 2

[0064] Such as Figure 4 As shown, this embodiment provides a GaAs-based flip-chip LED chip. The GaAs-based flip-chip LED chip is prepared by the method for preparing the GaAs-based flip-chip LED chip described in Example 1. The GaAs-based flip-chip LED chip include:

[0065] A plurality of array structures and a bonding layer, a reflective layer, and a substrate sequentially arranged on the plurality of array structures; wherein:

[0066] The initial structure includes an epitaxial wafer and a metal contact layer on the upper surface of the epitaxial wafer;

[0067] The epitaxial wafer sequentially includes a GaAs substrate, an AlGaAs buffer layer, a GaInP corrosion stop layer, an N-GaAs layer, a quantum well layer, a P-GaAs layer, and a P-GaP ohmic contact layer from bottom to top;

[0068] The cutting line is formed by sequentially performing wet etching, chemical wet etching and ultrasonic vibration on the initial structure;

[0069] The wet etching is used to etch from...

Embodiment 3

[0080] This embodiment provides an LED display device, which includes the GaAs-based flip-chip LED chip described in Embodiment 2.

[0081] The LED display device in this embodiment can improve the product yield because the GaAs-based flip-chip LED chip described in Embodiment 2 is used.

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Abstract

The invention provides a GaAs-based LED (light emitting diode) flip chip and a preparation method thereof and an LED display device. The GaAs-based LED flip chip comprises a GaAs substrate, an AlGaAs buffer layer, a GaInP etching stop layer, an N-GaAs layer, a quantum well layer, a P-GaAs layer and a P-GaP ohmic contact layer in sequential preparation from bottom to top. A metal contact layer is prepared on the P-GaP ohmic contact layer; a bonding graph in size identical to preset cutting way size of an LED chip is prepared on the metal contact layer; a wet etching process is adopted for etching a cutting way to the upper surface of the N-GaAs layer according to the prepared bonding graph; a bonding layer and a reflection layer are sequentially prepared on a substrate, and the substrate with the reflection layer and the bonding layer is subjected to bonding with an epitaxial wafer treated at the last step for 200-300ms at 300-400 DEG C; a GaAs substrate and the AlGaAs buffer layer are removed by adoption of a chemical wet etching process; the epitaxial wafer treated at the last step is added into acetone solution, and ultrasonic vibration is performed for 3-8min at 30-60 DEG C according to an ultrasonic frequency of 30-60MHZ to remove the GaInP etching stop layer and the N-GaAs layer. The GaAs-based LED flip chip and the preparation method thereof and the LED display device have the advantage that product yield can be increased.

Description

technical field [0001] The invention relates to the technical field of LED chip preparation, in particular to a GaAs-based flip-chip LED chip, a preparation method thereof, and an LED display device. Background technique [0002] GaAs-based LED chips can be used as both light-emitting devices and optoelectronic display devices, and are widely used for their advantages of low energy consumption and high brightness. In the preparation process of GaAs-based LED chips, it is an indispensable process to divide the entire chip into single grains of the required size. [0003] At present, when cutting the GaAs-based flip-chip LED chip, it is realized by using a diamond knife, and the chip after cutting is cleaned. [0004] However, because the GaAs material is relatively brittle, and the front and back of the chip will be vapor-deposited with relatively thick metal materials, the stress on the chip itself is relatively large. In addition, the diamond knife directly contacts the ch...

Claims

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Application Information

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Patent Type & AuthorityApplications(China)
IPC IPC(8): H01L33/00H01L33/48H01L33/60
CPCH01L33/0062H01L33/48H01L33/60
Inventor米洪龙关永莉梁建徐小红王琳
OwnerSHANXI FEIHONG MICRO NANO PHOTOELECTRONICS SCI & TECH