Preparation method of after-sun repair mask containing fucus serratus extract

A technology for post-sun repairing mask and Fucus serrata, which is applied in skin care preparations, pharmaceutical formulas, cosmetic preparations, etc. It can solve the problems of difficult absorption of mask nutrients, functional effects that need to be improved, and skin inflammation. , to achieve the effect of maintaining mitochondrial function, helping to restore health and vitality, and promoting skin regeneration

Inactive Publication Date: 2018-10-16
卜俊超
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, many facial masks that appear on the market today contain a large amount of chemical compounds. Long-term use will have certain side effects on the skin, making the nutrients in the facial mask difficult to be absorbed, and even cause adverse reactions such as skin inflammation. Caused immeasurable losses. When making many masks on the market, there are big problems in the selection and dosage of chemical substances. There are few natural ingredients, and the skin care effect is not good. Further improvement is needed, and the functional effect needs to be improved.

Method used

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Embodiment Construction

[0024] The technical solutions in the present invention are clearly and completely described below in conjunction with the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0025] A preparation method for an after-sun repair mask containing Fucus serrata extract, comprising the following steps:

[0026] Step 1: Wash the Fucus serrata with water, place it in a ventilated and dry place for air-drying, place the air-dried Fucus serrata in a microwave oven, and dry it on medium heat for 4 minutes, put the dried Fucus serrata into Pulverize in a pulverizer, pass the pulverized Fucus serrata through a 60-mesh sieve to obtain Fucus serrata powder, weigh 10 g of Fucus serrata powder, and 100 g of deionized water, add them to a container, and store at 90°C Boil and extract for 100 minutes, take out all the mater...

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PUM

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Abstract

The invention provides a preparation method of an after-sun repair mask containing fucus serratus extract, and belongs to the technical field of mask preparation. The preparation method comprises steps as follows: preparation of the fucus serratus extract, proportioning of raw materials in parts by weight, preparation of an aqueous phase liquid, emulsification, cooling and the like. Fucus serratushas excellent sun-screening and moisturizing functions and is used for after-sun repair of damaged skin; radix glycyrrhizae and chamomile have effects of clearing away heat and toxic materials, resisting bacteria and inflammation and pacifying and calming skin, are suitable for various kinds of skin, especially sensitive skin and can be applied to after-sun repair of damaged skin. With adoption of nano supercritical propolis, permeation and absorption are quite easy, the problem about compatibility with other components is solved successfully, the nano supercritical propolis has functions ofstrongly resisting oxidation and inhibiting tyrosinase activity, and the whitening and freckle-removing effects are remarkable.

Description

technical field [0001] The invention relates to the technical field of facial mask preparation, in particular to a preparation method of an after-sun repairing facial mask containing Fucus serrata extract. Background technique [0002] Mask is an important step in skin care. Effective ingredients such as moisturizing, whitening, and anti-aging in the mask can be better absorbed by the skin. However, many facial masks that appear on the market today contain a large amount of chemical compounds. Long-term use will have certain side effects on the skin, making the nutrients in the facial mask difficult to be absorbed, and even cause adverse reactions such as skin inflammation. It caused immeasurable losses. When making many facial masks on the market, there are big problems in the selection and dosage of chemical substances. There are few natural ingredients, and the skin care effect is not good. Further improvement is needed, and the functional effect needs to be improved. C...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/34A61K8/37A61K8/41A61K8/44A61K8/49A61K8/64A61K8/66A61K8/73A61K8/81A61K8/92A61K8/9711A61K8/9789A61K8/98A61Q19/00A61Q19/02A61Q19/08
CPCA61K8/988A61K8/345A61K8/37A61K8/375A61K8/41A61K8/44A61K8/4946A61K8/64A61K8/66A61K8/735A61K8/8147A61K8/922A61K8/9711A61K8/9789A61Q19/00A61Q19/004A61Q19/02A61Q19/08
Inventor 卜俊超
Owner 卜俊超
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