Patterned light irradiation apparatus and method

Abstract

A patterned light irradiation apparatus is disclosed. The patterned light irradiation apparatus comprises a light source, a pattern grating, and a diaphragm, wherein the pattern grating includes a stripe shape in a form including repetition of a transmission part and a shielding part, and the diaphragm includes an aperture having a sinusoidal wave-shaped cross section. When the patterned light irradiation apparatus irradiates patterned light to a subject, the patterned light irradiation apparatus performs defocusing and thus can irradiate patterned light having an ideal sinusoidal form to thesubject. Therefore, a three-dimensional image of high quality can be acquired.

Description

technical field [0001] The present invention relates to a patterned light irradiation device and its method, more specifically, to a method of irradiating patterned light to a measurement object by passing light from a light source through a grating, or using an optical panel to irradiate a pattern image to irradiate a measurement object. Apparatus and method for patterned light. Background technique [0002] In general, a three-dimensional shape measuring device measures the three-dimensional shape of the object to be measured by irradiating patterned light generated by a grating and taking a reflected image of the grating patterned light. The light irradiation device for irradiating patterned light adopts a method in which a grating (grating) for forming a predetermined pattern, for example, patterned light in a sinusoidal form (or patterned light in a sinusoidal form) is positioned at the light source. Before, the light from the light source passes through the grating to...

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Problems solved by technology

In order to make the patterned light generated by such a patterned grating similar to a sine wave, it is necessary to further refine the light and dark phases of the patterned grating, which increases the cost and difficulty of manufacturing the patterned grating

[0010] In addition, when making a patterned grating, since there is a minimum size of a pattern that can be processed, there is a problem that even if the light and dark changes of the patterned grating are to be refined, the size required to represent a cycle of light and dark changes cannot be made, that is, Pattern spacing is reduced below a defined level

[0012] However, even in this method, a large number of pixels are required to irradiate the sinusoidal pattern light

That is, in order to irradiate patterned light that changes in brightness and darkness in the form of a sinusoidal wave, it is preferable to refine the degree of pattern brightness and darkness as much as possible. However, in order to refine the brightness and darkness of the pattern, it is necessary to use a large number of pixels to represent the pattern image. However, due to pixel The size of is fixed, and as a result, the limitation of not being able to reduce the interval below a given level occurs

In addition, there is also a problem that the capacity of the pattern image increases.

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