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A device with a pellicle and a method for removing a pellicle from a photomask and using the pellicle

A technology for photomasks and pellicles, which is applied in the field of devices with pellicles, and can solve problems such as increasing the risk of diaphragm rupture

Active Publication Date: 2019-04-05
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The removal process used to separate the pellicle from the photomask increases the risk of cracking the pellicle

Method used

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  • A device with a pellicle and a method for removing a pellicle from a photomask and using the pellicle
  • A device with a pellicle and a method for removing a pellicle from a photomask and using the pellicle
  • A device with a pellicle and a method for removing a pellicle from a photomask and using the pellicle

Examples

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Embodiment Construction

[0015] The following disclosure provides many different embodiments, or examples, for implementing different features of the presented subject matter. Specific examples of components, values, operations, materials, configurations, etc. are set forth below to simplify the present disclosure. Of course, these are examples only and are not intended to be limiting. Other components, values, operations, materials, configurations, etc. can be contemplated. For example, the description below that a first feature is formed on or on a second feature may include embodiments in which the first and second features are formed in direct contact, and may also include embodiments in which the first and second features are formed in direct contact. An embodiment where an additional feature may be formed between two features such that the first feature may not be in direct contact with the second feature. Additionally, this disclosure may reuse reference numbers and / or letters in various inst...

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PUM

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Abstract

A method of removing a pellicle from a photomask includes removing a portion of a membrane from a pellicle frame, wherein the pellicle frame remains attached to the photomask following the removing ofthe portion of the membrane. The method further includes removing the pellicle frame from the photomask. The method further includes cleaning the photomask.

Description

technical field [0001] Embodiments of the disclosure relate to a method of removing a pellicle from a photomask, a method of using a pellicle, and a device having a pellicle. Background technique [0002] A pellicle is used to cover a portion of a photomask used to transfer a pattern to a wafer using a photolithography process. The pellicle includes a frame attached to the photomask and a membrane extending across the top of the frame. The pellicle helps prevent particles from contacting the photomask and introducing distortion to the pattern to be transferred to the wafer. [0003] In some cases, the pellicle is removed from the photomask. For example, in some cases, the pellicle is removed if the diaphragm becomes clouded or damaged. The removal process used to separate the pellicle from the photomask increases the risk of cracking the pellicle. Contents of the invention [0004] An embodiment of the invention discloses a method for removing a pellicle from a photoma...

Claims

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Application Information

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IPC IPC(8): G03F1/62G03F1/82
CPCG03F1/62G03F1/82G03F1/64G03F1/68G03F7/2004G03F1/22
Inventor 游秋山涂志强陈建诚张宗裕谢昆龙许倍诚李信昌林云跃
Owner TAIWAN SEMICON MFG CO LTD
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