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Diffraction device and diffraction measure method

A diffraction device and detector technology, which is applied in the field of X-ray measurement, can solve the problems of weak X-ray diffractometer strength, limited X-ray application, and inability to apply research.

Pending Publication Date: 2019-10-22
SOUTH UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA
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Problems solved by technology

[0003] However, for a long time, limited by the weak intensity and large spot of the X-ray diffractometer in ordinary laboratories, and the inability to perform transmission diffraction measurements, it cannot be applied to research under extreme conditions, which greatly limits the application of X-rays in scientific research. application on

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  • Diffraction device and diffraction measure method

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Embodiment Construction

[0033] The diffraction device and diffraction method provided by the embodiment of the present invention can complete the integration and construction of extreme condition sample environments (including high pressure, low temperature, high temperature, etc.) in ordinary laboratories, so as to realize in-situ X-ray diffraction measurement under extreme conditions, saving time , labor-saving and efficient.

[0034] The conception, specific structure and technical effects of the present invention are clearly and completely described below in conjunction with the embodiments and accompanying drawings, so as to fully understand the purpose, scheme and effect of the present invention. It should be noted that the embodiments in the present application and the features in the embodiments can be combined without conflict. In addition, the descriptions such as up, down, left, and right used in the present invention are only relative to the positional relationship of the various componen...

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Abstract

The invention belongs to the technical field of X-ray measurement, and discloses a diffraction device and a diffraction measurement method. The diffraction device comprises a light source generator, asample carrier, a detector and a diamond anvil cell. The light source generator can provide X-rays for testing. The detector is used for recording the number of photons of the X-rays of different angles after diffraction with the sample. A closed cavity is formed between the sample carrier and the diamond anvil cell. The cavity is used for placing the sample. The cavity can be pressed from the two sides of the diamond anvil cell to the top direction so that high-pressure in-situ diffraction measurement can be realized in a common laboratory.

Description

technical field [0001] The invention belongs to the technical field of X-ray measurement, and in particular relates to a diffraction device and a diffraction measurement method. Background technique [0002] Comprehensive extreme conditions (including high pressure, low / high temperature, etc.) in-situ measurement technology, such as in-situ X-ray diffraction, Raman, infrared and other cutting-edge in-situ measurement methods can obtain important information of substances in the pressure dimension, and create new states of matter. , synthesis of new materials, and discovery of new phenomena provide opportunities. Compared with other characterization methods, X-ray diffraction (XRD) is one of the most important, effective and direct means to observe the structure or morphology of atoms and molecules inside crystalline substances. [0003] However, for a long time, limited by the weak intensity and large spot of the X-ray diffractometer in ordinary laboratories, and the inabil...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N23/207
CPCG01N23/207
Inventor 王善民陈娥赵予生
Owner SOUTH UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA
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