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Error Analysis Method of Photoelectric Signal Simulation

An error analysis, photoelectric signal technology, applied in the direction of instruments, control/adjustment systems, simulators, etc., to achieve the effect of ensuring confidence

Active Publication Date: 2021-09-24
SHANGHAI INST OF ELECTROMECHANICAL ENG
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This error exists because the infield test is based on the modeling of the target / environmental characteristics based on the similarity principle, and the target / environmental characteristics are generated through the equivalent simulation of the simulator

Method used

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  • Error Analysis Method of Photoelectric Signal Simulation
  • Error Analysis Method of Photoelectric Signal Simulation
  • Error Analysis Method of Photoelectric Signal Simulation

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Embodiment Construction

[0051] The present invention will be described in detail below in conjunction with specific embodiments. The following examples will help those skilled in the art to further understand the present invention, but do not limit the present invention in any form. It should be noted that those skilled in the art can make several changes and improvements without departing from the concept of the present invention. These all belong to the protection scope of the present invention.

[0052] According to a kind of photoelectric signal simulation error analysis method provided by the present invention, comprising:

[0053]Step 1: selecting the photoelectric signal simulation error analysis index, the error analysis index is based on the signal information collected on the imaging detector;

[0054] Step 2: Establish a photoelectric signal simulation error model, the error model adopts a multi-layer model structure, at least including bottom-level indicators, middle-level indicators, a...

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Abstract

The present invention provides a kind of photoelectric signal simulation error analysis method, selects the photoelectric signal simulation error analysis index, builds the photoelectric signal simulation error model, carries out the semi-physical simulation test for the error analysis index, and obtains the experimental data required for the calculation of the error analysis index; Calculate the error analysis index and convert the measurement range, calculate the underlying index in the error model according to the experimental data; construct a judgment matrix, calculate the weight of the error analysis index, and perform consistency check based on the judgment matrix; calculate and consistency based on the error analysis index Check to get the final photoelectric signal simulation error. For the imaging detector, by studying the theory and method of photoelectric signal simulation error analysis, the error model is established, and the error analysis is completed by using the measured data. Through the error analysis of the photoelectric signal simulation, the simulation model can be checked, and the fidelity of the optical signal simulation can be analyzed and evaluated to ensure the confidence of the hardware-in-the-loop simulation test results.

Description

technical field [0001] The invention relates to a photoelectric signal simulation error analysis method, which is mainly applied to the analysis and evaluation of the fidelity of optical signal simulation in a semi-physical simulation system of optical guided missiles. Background technique [0002] The analysis and evaluation of optical signal simulation fidelity is the process of determining whether the simulation results can accurately represent the actual system under the application purpose of modeling and simulation, and it is an important way to ensure the credibility of modeling and simulation. The purpose of simulation fidelity analysis is to enable the simulation system to reproduce the behavior of the prototype system to a certain extent, so as to achieve specific simulation purposes. Since the simulation is only a similar or approximate simulation of the actual system behavior, it is necessary to analyze the fidelity of the optical signal simulation so that the si...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G05B17/02
CPCG05B17/02
Inventor 李凡李奇杨扬陈钊唐成师张小威沈涛
Owner SHANGHAI INST OF ELECTROMECHANICAL ENG
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