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Projection objective lens of photoetching machine

The technology of projection objective lens and lithography machine is applied in the field of projection objective lens, which can solve the problems of multiple and complex lens structures and low lens precision, and achieve the effects of fewer lenses, high precision and simple structure.

Pending Publication Date: 2019-12-03
ZHONGSHAN UVATA OPTICAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Aiming at the problems in the prior art that the precision of the projection objective lens is low and the lenses have multiple and complex structures, this technical solution provides a lens detection device that can move the detection device

Method used

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  • Projection objective lens of photoetching machine
  • Projection objective lens of photoetching machine
  • Projection objective lens of photoetching machine

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Embodiment Construction

[0063] In order to make the technical problems, technical solutions and beneficial effects solved by the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0064] Such as figure 1 As shown, a projection objective lens of a lithography machine, along the optical axis from the object plane to the image plane, at least includes: a first lens 1, a second lens 2, a third lens 3, a fourth lens 4, and a fifth lens 5 , the sixth lens 6, the seventh lens 7 and the eighth lens 8, characterized in that:

[0065] The object plane side of the first lens 1 is a plane, the image plane side is a convex surface, and its refractive power is positive;

[0066] The object plane side of the second lens 2 is a convex surface, the image plane s...

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Abstract

The invention discloses a projection objective lens of a photoetching machine, which at least comprises a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, a seventhlens and an eighth lens in sequence from an object plane to an image plane along an optical axis, wherein the object plane side of the first lens is a plane, the image plane side is a convex plane, and the focal power is positive; the object plane side of the second lens is a convex plane, the image plane side is a plane, and the focal power is positive; the object plane side of the third lens isa convex plane, the image plane side is a convex plane, and the focal power is positive; the object plane side of the fourth lens is a plane, the image plane side is a concave plane, and the focal power is negative; the object plane side of the fifth lens is a plane, the image plane side is a convex plane, and the focal power is positive; the object plane side of the sixth lens is a concave plane,the image plane side is a concave plane, and the focal power is negative; the object plane side of the seventh lens is a concave plane, the image plane side is a convex plane, and the focal power ispositive; and the object plane side of the eighth lens is a convex plane, the image plane side is a plane, the focal power is positive. The structure is simple and precision is high.

Description

【Technical field】 [0001] The present application relates to a projection objective lens, in particular to a projection objective lens of a photolithography machine. 【Background technique】 [0002] With the increasing demand for micro-nano processing equipment, various manufacturers can use photolithography machines to produce products with various complex shapes. Through maskless lithography machine users design corresponding graphics according to their own needs for lithography processing, without the need to manufacture masks first, which can save processing time and costs, and effectively improve the production efficiency of lithography machines. The projection objective lens of maskless lithography is the key factor affecting the accuracy. Currently, the lenses on the market have the problems of complex structure, large number of lenses, and low accuracy. [0003] To sum up, designing a high-precision projection objective lens for a lithography machine is a problem to b...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G02B13/00
CPCG03F7/70241G02B13/00
Inventor 王瑶
Owner ZHONGSHAN UVATA OPTICAL
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