A system and method for laser direct writing of micro-nano structures based on single-wavelength double-beams

Abstract

The invention discloses a laser direct writing micro-nano structure system based on single-wavelength and double-beam, including: a pulse laser 1, a first high-speed optical switch 2, a first 4f lens group 3, a first spatial filter aperture 4, a polarization Beam splitter 5, continuous laser 6, second high-speed optical switch 7, second 4f lens group 8, second spatial filter aperture 9, spiral phase plate 10, quarter slide 11, first mirror 12, A first half mirror 13, an objective lens 14, and a sample 15 to be photoetched. In this scheme, two laser beams of the same wavelength are selected as the excitation light source and the suppression light source respectively, and the high transient light intensity of the excitation light is used to ensure the nonlinear absorption of the material to trigger the photopolymerization reaction, realize the micro-nano structure processing, and then combine the phase modulation technology The focal point of the suppressed light is adjusted to a hollow shape, so that the polymerization reaction is further localized in the central area of ​​the excitation light, so as to achieve the purpose of compressing the size of the polymerization.

Description

technical field [0001] The invention relates to the technical field of nano-processing, in particular to a system and method for laser direct writing of micro-nano structures based on single-wavelength and double-beams. Background technique [0002] Femtosecond laser direct writing technology has been widely used in many industrial manufacturing and scientific research fields due to its advantages of high processing precision, small thermal effect, low damage threshold, and the ability to process any three-dimensional graphics. The traditional single-beam femtosecond laser direct writing processing method, with the help of the nonlinear two-photon absorption process of the processing material, combined with the threshold effect of the material, can use visible light to achieve micron and sub-micron scale processing accuracy, but the processing resolution is still affected by optical diffraction. The limit limit restricts its further development. [0003] In order to solve t...

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Problems solved by technology

On the premise that the material properties meet the aforementioned two-photon absorption and the subsequent photochemical process can be effectively suppressed, there may be problems in optical design: First, two beams of light of different colors require at least two kinds of lasers, which increases the processing cost and weakens the Processing system development can be integrated; secondly, after the two beams of different colors are focused by the lens, due to the different wavelengths, the size of the focused spot is different, and there are certain difficulties and deviations in judging the spatial overlap. The degree of inferiority is the key to the final result; again, in the design of the optical path after the spatial combination of two laser beams of different colors, the optical element needs to satisfy the photoresponse characteristics of the two different colors at the same time, and support the near-infrared and visible light bands at the same time. It is bound to introduce the problems of dispersion and low energy utilization, and bring about the complexity of the system and increase the cost of optical design; finally, the complexity of wavelength matching of optical components will limit the further expansion and integration of the system, which is not conducive to the entire processing Systematization and integration of methods

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