Photoresist material, display panel and production method thereof

A technology for photoresist materials and display panels, applied in the fields of display panels and their preparation, and photoresist materials, can solve problems such as insufficient transmittance of display panels, and achieve the effects of shortening exposure time, enhancing cross-linking degree, and high resolution

Pending Publication Date: 2020-07-24
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] An object of the present invention is to provide a photoresist material that can solve the problem of insufficient transmittance of display panels in the prior art

Method used

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  • Photoresist material, display panel and production method thereof
  • Photoresist material, display panel and production method thereof

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Embodiment Construction

[0027] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Apparently, the described embodiments are only some of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without making creative efforts belong to the scope of protection of this application.

[0028] The terms "first" and "second" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of said features. In the description of the present application, "plurality" means two or more, unless otherwise specifically defined.

[0029] The following disclosu...

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Abstract

The invention discloses a photoresist material, a display panel and a production method thereof. The photoresist material contains phenolic resin and graphene nanosheets, the graphene nanosheets are atwo-dimensional net structure, the graphene nanosheets are uniformly dispersed in the phenolic resin, and the phenolic resin forms a three-dimensional net structure. The graphene nanosheets are usedas a black pigment to be applied to a black matrix photoresist material, and the ultrathin and netted graphene nanosheets can be uniformly dispersed in a resin matrix and are not easy to agglomerate so that the resin can form the three-dimensional net structure, and a crosslinking degree of the resin is enhanced.

Description

technical field [0001] The present application relates to the field of mobile display panels, in particular to a photoresist material, a display panel and a preparation method thereof. Background technique [0002] The black matrix (Black Matrix, BM) is an important part of the color filter substrate (ColorFilter, CF) of the liquid crystal display panel, and its function is to play a shielding role, prevent light leakage and improve contrast. Generally, black matrix photoresist is composed of phenolic resin, monomer, carbon black, photoinitiator, and dispersant. The process of black matrix photoresist includes coating, pre-baking, exposure, development, hard-baking and other processes. [0003] With the advancement of technology, the market has higher and higher requirements for the performance and process level of liquid crystal display screens, including short response time, high penetration rate, etc., and the effective way to improve the penetration rate is to realize th...

Claims

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Application Information

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Patent Type & AuthorityApplications(China)
IPC IPC(8): G03F7/004G02F1/1335
CPCG03F7/004G02F1/133512
Inventor任元方群
OwnerWUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD