Multi-working-mode plasma power supply with adjustable energy density

A working mode, plasma technology, applied in the direction of plasma, conversion equipment that can be converted to DC without intermediate conversion, irreversible DC power input conversion to AC power output, etc., can solve the problem of weak load adaptability and dynamic response Slow, low power factor and other issues, to achieve the effect of improving adaptability, fast dynamic response, and reducing loss

Active Publication Date: 2021-03-09
SOUTH CHINA UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] According to the prior art literature, the plasma power supply has large volume, low efficiency, low power factor, and slow dynamic response (Chen Kansong, Gu Haoshuang, Sun Fenglou, etc. A new type of medium-frequency AC plasma power supply [J ].Journal of Circuits and Systems, 2006(04):78-81.), issues such as weak load adaptability (Ben Hongqi, Jin Zumin, Hao Yanling. Research on micro-plasma oxidation power supply in peak current control mode[J]. Power Electronics Technology, 2004 (02):59-61.)

Method used

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  • Multi-working-mode plasma power supply with adjustable energy density
  • Multi-working-mode plasma power supply with adjustable energy density
  • Multi-working-mode plasma power supply with adjustable energy density

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Embodiment

[0048] A multi-working mode plasma power supply with adjustable energy density, such as figure 1 As shown, it includes a main circuit and a control circuit; the main circuit includes a rectification and filtering module, a full-bridge inverter module, a primary side resonant inductance module and an intermediate frequency transformer module connected in sequence;

[0049] The rectification and filtering module is connected to the three-phase AC input power supply; the full-bridge inverter module is connected to the control circuit to realize the power output controlled by the control circuit; the primary side resonant inductance module is connected to the full-bridge inverter module; the intermediate frequency transformer module is originally One side is connected to the full-bridge inverter module, and the secondary side is connected to the load.

[0050] Described control circuit comprises DSP controller module, signal detection module; DSP controller module is connected wit...

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Abstract

The invention discloses a multi-working-mode plasma power supply with adjustable energy density. The power supply comprises a main circuit and a control circuit. The main circuit comprises a rectification filtering module, a full-bridge inversion module, a primary side resonance inductance module and an intermediate frequency transformer module which are connected in sequence. The control circuitcomprises a DSP controller module and a signal detection module. The improved driving capability of the plasma power supply can be improved, the adaptability of the plasma power supply to various plasma generators is enhanced, the power supply efficiency is improved, the dynamic characteristics of the power supply are improved, and the software and hardware cost is reduced.

Description

technical field [0001] The invention belongs to the field of plasma, in particular to the field of plasma power supply, in particular to a multi-working mode plasma power supply with adjustable energy density. Background technique [0002] Plasma technology is widely used in electronics, communications, automobiles, textiles, biomedical and other fields. The excitation methods of plasma mainly include methods such as electric field, light, high-energy rays or high temperature. The preparation methods in industry often use high-voltage electricity as excitation, and the electrons, ions or high-energy particles in the gas are accelerated by the electric field to make them collide with each other. The gas is ionized, thereby producing a plasma. [0003] Due to the sharp instantaneous change of the plasma load, higher requirements are put forward for the dynamic response of the power system. The traditional plasma power supply adopts high-voltage DC excitation, which has diffic...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H02M5/458H02M7/48H02M7/5387H02M5/12H05H1/24
CPCH02M5/458H02M7/48H02M7/53873H02M5/12H05H1/24Y02B70/10
Inventor 薛家祥杨晨
Owner SOUTH CHINA UNIV OF TECH
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