Light-absorbing host material, composition, optical film, preparation method thereof, and optoelectronic device

A main material and light-absorbing technology, which is applied in the direction of luminescent materials, chemical instruments and methods, circuits, etc., to achieve the effect of increasing viewing angle, high resolution, and reducing crosstalk

Pending Publication Date: 2022-03-18
THE HONG KONG UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

They are not suitable bulk materials for efficient down-converting films forming high-resolution self-emissive displays

Method used

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  • Light-absorbing host material, composition, optical film, preparation method thereof, and optoelectronic device
  • Light-absorbing host material, composition, optical film, preparation method thereof, and optoelectronic device
  • Light-absorbing host material, composition, optical film, preparation method thereof, and optoelectronic device

Examples

Experimental program
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Effect test

preparation example Construction

[0177] Preparation method of optical film

[0178] The present invention also provides a method for preparing an optical film, comprising the following steps:

[0179] providing the composition described above, and

[0180] The composition is evaporated to form an optical film.

[0181] Alternatively, when the optical film has a specific pixel pattern, the composition is evaporated and passed through a shadow mask with a specific pixel pattern to form a film with a specific pixel pattern

[0182] In one aspect, the optical film is formed by deposition vacuum thermal evaporation. The perylene-based host material and light-emitting dopant are co-evaporated. Exemplary vacuum thermal evaporation techniques include, but are not limited to, point or thermal evaporation sources, near-space sublimation from area evaporation sources, and organic vapor deposition.

[0183] Optical films, such as organic down-converting films, can be deposited as a cover layer or as an array of pix...

Embodiment 1-1

[0197] The mixture of compound 1a and 1b was vacuum (10 -6 Torr) was deposited on a quartz substrate to form a 50 nm film. The film is then encapsulated with a quartz lid and UV-cured epoxy.

Embodiment 1-2

[0199] Example 1-2 was prepared in the same manner as in Example 1-1 except that the thickness of the film was changed to 100 nm.

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Abstract

The invention provides a compound which can be used as a host material of an optical film such as a down-conversion film, a host material for absorbing light, a composition for forming the optical film, the optical film, a preparation method of the optical film, and an optoelectronic device comprising the optical film. In particular, the present invention relates to host materials and compositions for forming down-conversion films included in micro LED micro displays, VR displays, AR displays, or OLED micro displays, as well as related methods, applications, and devices.

Description

technical field [0001] The invention belongs to the field of optoelectronic technology, and specifically relates to a compound that can be used as a host material of an optical film such as a down-conversion film, a host material, a composition for forming an optical film, an optical film, a preparation method of an optical film, and an optical film comprising the optical film. Optoelectronic devices of films, in particular to host materials and compositions for forming down conversion films included in micro LED microdisplays, VR displays, AR displays or OLED microdisplays, and related methods, applications and devices. Background technique [0002] Down-conversion (also known as color conversion, color change) is an important method to achieve full color in self-emitting displays such as organic light-emitting diode (OLED) displays and LED / micro-LED displays. In a general scheme, a down-conversion film is used to absorb short-wavelength light emitted by a UV or blue light ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07C15/20C09K3/00C09K11/06H01L27/32H01L33/50
CPCC07C15/20C09K3/00C09K11/06H01L33/502C07C2603/52C09K2211/1011C09K2211/1029C09K2211/104C09K2211/1055C09K2211/1088C09K2211/188C09K2211/186C09K2211/1037C09K2211/107H10K59/38
Inventor 董首成姜毅斌邓清云
Owner THE HONG KONG UNIV OF SCI & TECH
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