The embodiment of the invention provides an epitaxial structure of an
infrared detector and a preparation method thereof, the
infrared detector comprises a substrate, and the epitaxial structure comprises a buffer layer, a P-type layer, an i long
wave absorption layer, an N-type layer and a cover layer which are sequentially stacked on the substrate from bottom to top; wherein the P type layer comprises an InAs / GaInSb
superlattice structure layer; the i long
wave absorption layer comprises an InAs / GaInSb
superlattice structure layer; and the N-type layer comprises an InAs / GaInSb
superlattice structure layer. The epitaxial structure, the i long
wave absorption layer, the P-type layer and the N-type layer all comprise the InAs / GaInSb superlattice structure
layers, GaInSb ternary components in the superlattice structure
layers have the advantages of long carrier life and
high absorption coefficient, the performance of the
infrared detector is improved, in addition, the InAs / GaInSb superlattice material is thinner in
layer thickness reaching a specific
cut-off
wavelength, and the performance of the
infrared detector is improved. And
miniaturization of the
infrared detector is facilitated.