Space scanning based alignment signals sampling synchronous control method
A technology of signal sampling and space scanning, which is applied in the direction of photolithography exposure devices, microlithography exposure equipment, etc., can solve the problems of inability to realize synchronous detection, inability to guarantee high-precision detection of light intensity signals and position signals, and large errors
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[0054] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0055] In order to complete the alignment and positioning on the horizontal plane in the alignment synchronous scanning of the lithography machine, the present invention adopts a transmissive upper and lower alignment grating plate with vertical grating patterns. As shown in Figure 1, the vertical grating patterns include gratings in the x direction and Raster in the y direction.
[0056] In this embodiment, the light intensity signal can be obtained by using the spatially aligned scanning device as shown in FIG. 2 . As shown in Figure 2, the light emitted by the alignment light source 3 is irradiated on the alignment dimming plate 4, so that the light intensity and direction of the light can be adjusted, and the optical signal continues to pass through the alignment upper grating 5 and the alignment lower grating 6 Alignment scanning is carried out by...
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