Unlock instant, AI-driven research and patent intelligence for your innovation.

Lithographic printing system with placement corrections

a technology of placement correction and lithographic printing, which is applied in the field of lithographic printing system with placement correction, can solve the problems of difficult data path problems in the use of the rotor

Active Publication Date: 2010-09-09
MICRONIC LASER SYST AB
View PDF20 Cites 30 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Use of the rotor presents very challenging data path issues, as the data is presented in a Cartesian grid that requires translation or mapping for use in a polar scanning system, in which the actual scanning path also involves linear motion of the workpiece as the scanning arm rotates.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Lithographic printing system with placement corrections
  • Lithographic printing system with placement corrections
  • Lithographic printing system with placement corrections

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0016]The following detailed description is made with reference to the figures. Preferred embodiments are described to illustrate the present invention, not to limit its scope, which is defined by the claims. Those of ordinary skill in the art will recognize a variety of equivalent variations on the description that follows.

[0017]The technology disclosed relates to a method and apparatus for compensating for scan direction displacements along a first axis by adjusting timing delays in loading an SLM and compensating for the transverse direction displacements along a second axis by resampling in 1D. The 1D resampling may use the gradient assisted resampling method of the related application referenced above.

[0018]Applying this technology a pattern is rasterized to a Cartesian coordinate system and then interpolation, translation or resampling is applied to select data to drive a modulator, such as a 1D SLM. The modulator responds to the data as it sweeps a pattern generating beam acr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The technology disclosed relates to methods and devices that compensate for displacements in a pattern or deformations of a workpiece. In particular, this relates to using timing to compensate for displacements along a first axis along the scanning direction while using resampling, interpolation or a similar method to compensate for displacements along a second axis that is substantially orthogonal to the first axis. The scanning direction may be an actual direction of movement of the scanning head or it may be a direction perpendicular to an orientation of an image projected onto a workpiece.

Description

RELATED APPLICATION[0001]This application claims the benefit of U.S. Provisional Application No. 61 / 158,310, filed 6 Mar. 2009, which is hereby incorporated by reference.[0002]This application is related to US patent application entitled “Rotor Optics Imaging Method and System with Variable Dose During Sweep”; and US patent application entitled “Variable Overlap Method and Device for Stitching Together Lithographic Stripes”; and US patent application entitled “Rotor Imaging System and Method with Variable-Rate Pixel Clock”; all filed contemporaneously. The related applications are incorporated by reference.[0003]This application is related to U.S. patent application Ser. No. 12 / 706,624, entitled “Improved SLM Device and Method”, filed 16 Feb. 2010. This application is also related to U.S. patent application Ser. No. 12 / 631,595, entitled “Gradient Assisted Image Resampling In Micro-Lithographic Printing”, filed 4 Dec. 2009. The related applications are incorporated by reference.BACKG...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G06T5/00
CPCG03F7/70291G03F7/70366G03F7/70516G03F7/70508G03F7/70783G03F7/70433G01B11/303G03F7/70591
Inventor SANDSTROM, TORBJORN
Owner MICRONIC LASER SYST AB