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This invention discloses a method for identifying photomask defects, belonging to the field of photomask inspection technology. The method includes: S1, acquiring a surface defect image; S2, preprocessing the surface defect image based on the imaging characteristics of the defect; S3, correcting the preprocessed surface defect image using a filtering algorithm; S4, performing colorimetric analysis on the corrected surface defect image to obtain particle regions; S5, segmenting the particle regions based on the morphological features of the defect to obtain defect islands; S6, performing morphological analysis on the defect islands to obtain the defect type and size. The photomask defect identification method provided by this invention automatically processes surface defect images and extracts defect islands by combining morphological and colorimetric analysis methods, improving the accuracy of defect identification, overcoming the limitations of differences in imaging systems across different devices, achieving automatic batch processing, and saving manpower and material resources in mass production.