Automatic exposure measuring method

A technology of automatic exposure and measurement methods, applied in optics, television, focusing devices, etc., can solve problems such as insufficient matching

Inactive Publication Date: 2009-02-11
PRIMAX ELECTRONICS LTD
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0027] However, it is known that the matching degree of OES (that is, choosing the correct pattern) is still not good enough

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Automatic exposure measuring method
  • Automatic exposure measuring method
  • Automatic exposure measuring method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0051] Measurement method of the present invention comprises two parts:

[0052] (1). Subject detection, and

[0053] (2). Use the AE measurement function to calculate the exposure value.

[0054] Subject detection is not the same as well-known subject growth. The subject detection of the present invention does not preset the central area as the area where the subject is located. The method of the present invention uses focus value (FV) information to determine whether the subject is centered, left or right. In addition, the present invention provides a new AE measurement function to replace the AMP lookup table. The AE measurement function of the present invention is relatively simple and compact without the need of a look-up table.

[0055] image 3 is a flowchart of the measurement method of the present invention. First, the light information from the DSC sensor is received and checked to see if the system already has focal length information. If the system already h...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

This invention provides one automatic exposure measurement method to determine exposure value with host image, which comprises the following steps: host testing step to test image host position by use of focus value; exposure value computing step to compute image exposure value by use of automatic exposure computation function.

Description

technical field [0001] The invention relates to an automatic exposure measurement method for a digital camera. Background technique [0002] Automatic exposure (Automatic exposure (AE)), automatic white balance (automatic white balance (AWB)) and automatic focus (automatic focus (AF)), called 3A, are three in the digital still camera (DSC) system important technology. AE is mainly used to control the amount of light reaching the sensor and prevent overexposure or underexposure. [0003] The purpose of AE is to achieve a good exposure balance in the image, including two parts of measurement algorithm and exposure control. [0004] First, a measurement algorithm evaluates the amount of light hitting the sensor and calculates the appropriate exposure value (EV). Then, in terms of hardware control, the exposure control mechanism will control three related devices based on the obtained exposure value, i.e. aperture diameter, shutter speed and sensor sensitivity. [0005] When...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G03B13/36H04N5/232
Inventor 林锦池罗瑞祥傅楸善朱峻贤
Owner PRIMAX ELECTRONICS LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap