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Method and apparatus for replicating microstructured optical masks

A photomask and microstructure technology, applied in the field of photomask, can solve the problems of shortened lifespan, damage, and wear of the mainboard, and achieve the effect of improving system practicability and reliable process

Inactive Publication Date: 2009-12-30
SEEREAL TECHNOLOGIES
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Motherboards also take a lot of wear and tear from this cleaning job
Also, any additional handling introduces a risk of damage, so the life of an expensive motherboard can be significantly shortened

Method used

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  • Method and apparatus for replicating microstructured optical masks
  • Method and apparatus for replicating microstructured optical masks
  • Method and apparatus for replicating microstructured optical masks

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0069] The initial distribution processing stage (a) is clearly shown in these figures. In the initial point application step (a1), a single initial point IP of the fluid to be cured is applied to the support plate TP. Here, the point IP is located at the center of the carrier plate TP.

[0070] In the track assignment step (a2), a plurality of tracks T1, T2... of fluid material are applied to the main plate M. Here, these traces spread from the center of the mainboard to the edge of the mainboard-replicating part of the MF. Here, the trajectories are contiguous.

[0071] In the dispensing step (a3), the required amount of fluid material is applied to the main plate M, here the center of the plate, forming an integral initial fluid portion IF whose vertical apex forms a corresponding point KP. As shown in the figure, the corresponding point KP corresponds to the initial point IP on the carrier plate TP.

[0072]Figure 2A shows a replicating device similar to that shown in ...

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Abstract

The invention relates to a method and an apparatus for replicating planar, thin-layered, and microstructured flat lens systems and optical masks (LM) that are provided with such microstructured lens systems which are hardened from a highly viscous transparent fluid on a supporting substrate plate (TP). The fluid is introduced between a plate-shaped master plate (M) and a movable supporting substrate plate and remains joined to said substrate plate after hardening. The inventive method is carried out in a non-rotational manner while the molding space is not delimited by sidewalls or similar in the direction of expansion of the fluid. The inventive flat lens systems or optical masks are embodied as lenticulars, field lenses, or Fresnel lenses. The final shape of the mask is homogeneous, has a geometrically accurate layer thickness, and is free from air pockets. The inventive method and apparatus allow for controlled replication at great geometrical accuracy and extremely good optical quality.

Description

technical field [0001] Method and apparatus for replicating finely structured planar optical elements and photomasks with finely structured optical elements. [0002] The present invention relates to methods and apparatus for the reproduction of planar, finely structured, thin-film optical elements and photomasks having such structures, said optical elements being made of transparent highly viscous or viscous adhesives cured on a carrier or substrate Fluid manufacturing, where the fluid is injected into the cavity between the master plate (mold) and the movable carrier, and adheres to the carrier after curing. [0003] This method utilizes a swirlless flow. The mold cavity is not compressed by side walls etc. in the flow direction of the fluid to be cured. The main board is used as a prototype during the duplication process. It is in a horizontal, non-rotating position. The desired volume of fluid to be cured is injected into the mold cavity formed between the two plates w...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B29C31/04B29C43/56B29C35/08B29D11/00G02B27/22B29C39/02
CPCB29D11/00269G03H2001/0284B29D11/00413B29C2043/3644B29C31/045B29C43/56B29L2011/0016B29D11/00278B29C2043/3488B29C43/021B29C2043/3494B29L2011/005
Inventor 阿明·史威特纳
Owner SEEREAL TECHNOLOGIES