Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Mask system

A mask and head mask technology, applied in the field of mask system

Inactive Publication Date: 2010-01-06
RESMED LTD
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Consequently, these masks may be accidentally reused in a manner that creates a risk to the patient, such as the risk of spreading germs, etc.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask system
  • Mask system
  • Mask system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0066] Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings, in which the same reference signs represent the same component.

[0067] figure 1 The mask assembly 10 is shown, which includes a frame 12 in the form of a shell, and a cushion 14 attached to the frame 12. The rotating elbow 16 is rotatably connected or arranged on the frame 12. As known in the prior art, the rotating elbow 16 includes an air inlet tube 18 that receives pressurized breathable gas from a suitable pressurized gas source. The rotating elbow 16 includes one or more holes 20 for continuous discharge of CO discharged from the breathing cavity formed by the frame 12 and the cushion 14 2 gas. The frame 12 includes at least a pair of side extension frames 22, which support for receiving and headband (for example, see Figure 35-Figure 40 ) Connected connector clips (for example, see Figure 32-Figure 34 ) The connector clamp socket 24. The fr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A mask system includes a frame, cushion, cushion clip, swivel elbow, headgear and / or headgear clips that are configured for use in a clinical or hospital environment. One or more components of the mask system are configured to promote single patient use, e.g., by providing an age indicator and / or preventing disassembly and / or cleaning, etc.

Description

[0001] Cross-reference to priority applications [0002] This application requests protection for the U.S. Provisional Application No. 60 / 533,229 filed on December 31, 2003, the Application No. 60 / 571,488 filed on May 17, 2004, and the Application No. 60 / 588,341 filed on July 16, 2004. , And the interests of the petition number 60 / 619,022 submitted on October 18, 2004, which are hereby incorporated as references. Technical field [0003] The present invention relates to a disposable mask system for patients such as adult patients, which is used for the treatment of obstructive sleep apnea (OSA: obstructive sleep apnea), or for the use of continuous positive airway pressure (CPAP: continuous positive airway pressure). airway pressure), two-stage, or other pressure support ventilation, to provide non-invasive positive pressure ventilation (NIPPV: non-invasive positive pressure ventilation) support. The mask is for single patient and short-term use, the short-term has a life span of ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): A61M16/06A62B7/00A62B9/02
Inventor 安东尼·米迦勒·金戴维·约翰·沃博伊斯格雷戈里·斯科特·斯马特穆迪沙·普拉迪普·当唐那瑞亚那约翰·迈克尔·斯诺菲利普·托马斯·斯托拉德
Owner RESMED LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com